Examples of 'can be etched' in a sentence
Meaning of "can be etched"
can be etched - This phrase refers to a process of engraving or incising a design onto a surface. It is commonly used in the context of art, where artists etch designs on metal plates or glass to create intricate patterns or images
How to use "can be etched" in a sentence
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can be etched
Metal stencils can be etched into a pattern.
Can be etched or color imprinted.
The silicon dioxide layer can be etched to an underlying material layer.
It can be etched into or deposited on such photodiode 1.
The grained aluminum substrate can be etched chemically with an acid or an alkali.
The substrate 4 is made of a material that can be etched.
The DOEs can be etched directly into the substrate.
As in the first embodiment, the substrate can be etched selectively.
A microheatpipe can be etched using standard microchip fabrication processes.
The shorter the wavelength, the more transistors can be etched onto the silicon wafer.
The guide layer can be etched to constitute a defractive network.
This produces an n-p-n SiC structure that can be etched to produce an n-p-n wall.
The lid can be etched by using a wet chemical process.
Then one of the two domains can be etched to form the desired patterns.
The silicate can be etched to provide a nanostructured surface topology.
See also
The back-electrode can be etched using acid.
The trench can be etched using a plasma, ion beam, wet, or similar etch technique.
Alternatively, the holes can be etched simultaneously from both sides.
The wafer can be etched at an angle to create a beveled needle tip.
Thereafter, the layers of SiGe can be etched with etching stopping on silicon.
The matrix can be etched back leaving the fibres protruding.
The second conducting layer 3 b can be etched before oxidizing of the layer 3 a.
Frosted glass can be etched with interesting patterns and decorative motifs.
Similar diffractive structures can be etched into other far infrared materials such as zinc selenide.
These materials can be etched by plasma assisted or plasma unassisted chemical etching processes.
One or more regions R can be etched in the prismatic film 13.
The stops can be etched using CHF3 /O2 and the resin removed with fuming nitric acid.
Amorphous silicon can be etched using strong base such as NaOH or KOH.
Wall 34 can be etched away using organic solvents e . g.
This demonstrates that PTFE can be etched with the pulsed plasma to generate relief structures.
Sometimes art can be etched into the glass with abrasive, caustic, or acid materials.
The dielectric material can be etched by plasma, ion beam, or chemical etching techniques.
This face can be etched in accordance with a random profile ( rails, grooves, catamaran, etc ).
The pre-endoprosthesis can be etched and / or electropolished to provide a selected finish.
The electrodes can be etched in a thin layer on an insulating material.
Such surfaces can be etched to increase the effective surface área.
The substrate can be etched or smooth, and cleaned prior to coating.
Otherwise, stent matrixes can be etched from sheet material, either tubular or flat.
Intermediate layer 20 can be etched in different ways to produce the different devices described above.
Alternately, the stent can be etched in its tubular configuration with the same desired effect.
However, other materials can be etched using the same concept and the same passivating gases.
The layer 28 can be etched entirely or partially.
The first layer can be etched by anisotropic or isotropic etching, as represented in FIG . 3.
