Examples of 'cathodic sputtering' in a sentence
Meaning of "cathodic sputtering"
cathodic sputtering - This term refers to a physical vapor deposition process used in thin film deposition and surface coating. It involves bombarding a target material with high-energy ions to release atoms that form a thin film on a substrate
How to use "cathodic sputtering" in a sentence
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cathodic sputtering
It may be deposited by cathodic sputtering at room temperature.
Advantageously these layers are deposited by radiofrequency cathodic sputtering.
The contacts are formed by cathodic sputtering of gold in an argon atmosphere.
This deposition takes place by radiofrequency cathodic sputtering.
Reactive cathodic sputtering is advantageously used for the deposition of the various layers.
The deposition technique is cathodic sputtering.
Cathodic sputtering techniques are well known and will not be described here in detail.
These systems are substantially produced by cathodic sputtering processes.
In this latter case, the cathodic sputtering atmosphere is mainly formed of argon.
Bearing samples were produced by cathodic sputtering.
The structure that results from cathodic sputtering is a polycrystalline and locally non-homogeneous structure.
Deposition of this succession of layers is typically done by evaporation or cathodic sputtering.
The conditions under which this cathodic sputtering must be conducted are not very critical.
Electrochromic layers and inorganic electrolyte were deposited by cathodic sputtering.
These contacts can be produced by cathodic sputtering of nickel, germanium and gold.
See also
This layer can be deposited by vacuum evaporation or cathodic sputtering.
Process for producing cathodes for cathodic sputtering based on aluminium-silicon alloys.
All these layers were deposited by magnetic field assisted cathodic sputtering.
However, cathodic sputtering devices have the disadvantage that the evaporated material is only weakly ionized.
The coating is formed by cathodic sputtering.
Cathodic sputtering of the germanium ;.
The thin film is then deposited by cathodic sputtering or evaporation.
A plain bearing according to claim 4 wherein the physical vapour deposition technique is cathodic sputtering.
The bismuth oxide is deposited by reactive cathodic sputtering from a bismuth target.
This deposit is effected by a technique such as thermal evaporation or cathodic sputtering.
The glass was placed in the magnetron cathodic sputtering installation of Example 1.
It can be deposited for example through vacuum evaporation or cathodic sputtering.
In contrast, the layers obtained by cathodic sputtering under vacuum are referred to as “ soft ”.
The dielectric coatings are well known in the field of layers deposited by cathodic sputtering.
ITO was deposited by cathodic sputtering onto a CR-39 plate.
This second metal oxide film was deposited by a reactive cathodic sputtering technique.
After grinding both faces of the alumina substrate these are metallized by cathodic sputtering.
The two layers are advantageously deposited by radiofrequency cathodic sputtering in an oxidising atmosphere.
Usually, the piezoelectric material is deposited by techniques such as cathodic sputtering.
In contrast, these layers deposited by cathodic sputtering are fragile.
Preferably, as indicated above, this deposition is carried out by cathodic sputtering.
For methods taking place in plasma phase, cathodic sputtering may be cited.
Advantageously, the opaque metal layer is deposited by magnetton cathodic sputtering.
A metallic layer is then deposited on the dielectric layer by cathodic sputtering or evaporation.
Finally, the invention is not limited to the coverings obtained by cathodic sputtering.
Materials such as titanium or zirconium, deposited by evaporation or cathodic sputtering are preferred.
Other deposition methods can also be used, such as vacuum sublimation or cathodic sputtering.
This layer is deposited by PECVD or LPCVD, or possibly cathodic sputtering or even evaporation.
According to yet another feature, the first and second layers are deposited by cathodic sputtering.
It is e.g. possible to use cathodic sputtering.
The layer 83 may be provided with a titanium and tungsten alloy ( TiW ) deposited by cathodic sputtering.
For example, this deposit may be made by cathodic sputtering.
Step 2 illustrated in FIG . 13 b relates to the deposition of a molybdenum layer by cathodic sputtering.
All the layers have been deposited using magnetic field-assisted cathodic sputtering under vacuum.
However, it is possible to use any other known method such as e.g. cathodic sputtering.
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