Examples of 'deposition apparatus' in a sentence
Meaning of "deposition apparatus"
deposition apparatus: Equipment or tools used in the process of depositing a material onto a surface, often used in scientific or industrial settings
How to use "deposition apparatus" in a sentence
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deposition apparatus
Microwave plasma chemical vapour deposition apparatus.
Droplet deposition apparatus and methods of manufacture thereof.
Catalyst chemical vapor deposition apparatus.
Deposition apparatus with guide roller for long superconducting tape.
Method of testing components of pulsed droplet deposition apparatus.
Droplet deposition apparatus.
An ink jet printer is a particularly important example of droplet deposition apparatus.
Droplet deposition apparatus and method for manufacturing the same.
At present there are various etching and deposition apparatus types using a plasma.
The powder deposition apparatus preferably comprises a powder dispenser and a powder wiper.
The substrate thus prepared is then introduced into deposition apparatus under vacuum.
There is provided a vapor deposition apparatus that eliminates the need for a large silicone gasket.
The elemental chromium coating is applied using known conventional deposition apparatus and techniques.
The coating deposition apparatus used here is diagrammatically illustrated in FIGS.
Technical Field The present invention relates to droplet deposition apparatus.
See also
The present invention relates to droplet deposition apparatus and in particular to ink jet printers.
Figure 1 shows a schematic diagram of a pulsed laser deposition apparatus.
Droplet deposition apparatus comprising,.
More particularly, it relates to a cathodic arc deposition apparatus.
The catalytic chemical vapor deposition apparatus 1 is constituted as described above.
High density multi-channel array, electrically pulsed droplet deposition apparatus.
Method of manufacture of droplet deposition apparatus comprising the steps of,.
The vacuum deposition apparatus according to the invention is so arranged that it is possible,.
A method of operating droplet deposition apparatus comprising,.
Deposition apparatus according to claim 9, wherein said subdivision means comprises a grid or trellis.
Component for use in droplet deposition apparatus comprising,.
The high-temperature superconductor may be manufactured by using a vacuum deposition apparatus.
At predetermined times, the deposition apparatus 1 may be purged to avoid accumulation of substances.
It is known in the prior art that a valve-cell vacuum deposition apparatus includes,.
Deposition apparatus according to claim 9, wherein said subdivision means comprise a perforated plate.
Operating disfunctions in the deposition apparatus can produce, moreover, disuniformity of the layer.
Obviously, this temperature value can be lowered by adding cooling systems to the deposition apparatus.
Figure 5 depicts a plasma deposition apparatus 70 operative to deposit a plurality of semiconductor layers upon a substrate.
This invention relates to a method of testing multi-channel array pulsed droplet deposition apparatus.
Also provided is a droplet deposition apparatus as defined in Claim 9.
Fig. 1 is a schematic view showing an embodiment of a film deposition apparatus.
Applicants ' invention provides such a deposition apparatus and use thereof . SUMMARY OF THE INVENTION.
The deposition apparatus 5000 includes thirteen chambers connected to each other.
FIG 1 shows a schematic view of the deposition apparatus.
Figure 3 depicts a plasma deposition apparatus 70 which was employed in this experimental series.
Figure 5 is an exploded isometric view of the deposition apparatus of figure 4.
Figure 2 depicts a plasma deposition apparatus 70 suitable for use in the practice of the present invention.
Fig . 2 is a block diagram showing a configuration of the film deposition apparatus shown in Fig . 1.
Figure 1 depicts the vapour deposition apparatus also used in Examples IV, Vb, Vc, and Vd.
The coated tubing 21 then may be removed from the deposition apparatus 10.
The wire deposition apparatus 26 is mounted on the carriage 20.
It will be considered herein that the vacuum deposition apparatus 10 includes only one valve cell 20.
This vacuum deposition apparatus 10 includes first of all a source or valve cell 20.
FIG . 2 is a schematic overall view of a vacuum deposition apparatus according to a second embodiment ;.
A deposition apparatus 15 transports the building material 4 to the build region from a metering chamber 26.
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Examples of using Apparatus
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Do not use this apparatus with water
The apparatus should be used in moderate climate
Do not subject this apparatus to strong impact
Examples of using Deposition
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Informal local deposition industrial products waste
I am not going to mention any of that in the deposition
Tailings deposition and water management plans
