Examples of 'deposition method' in a sentence
Meaning of "deposition method"
This phrase refers to a specific technique or process used in scientific research or industrial applications to deposit or create thin films or coatings on a substrate. It involves the controlled deposition of materials onto a surface to achieve desired properties or functionalities
How to use "deposition method" in a sentence
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deposition method
Any conventional deposition method may be used.
Plasma reactor for performing an etching or deposition method.
It is possible to use a deposition method followed by mangling.
The deposition method according to the invention is simple to implement.
Refractive indexes and choice of deposition method.
The deposition method is described below.
Deposition device and deposition method using same.
Such a deposition method is known and will not be described in detail her.
The most common metal deposition method is sputtering.
The deposition method is cost effective and potentially scalable to industrial size.
Plasma activated chemical vapour deposition method and apparatus therefor.
The direct deposition method is further illustrated by the following example.
The apparent doping then results from the deposition method used.
Droplet deposition method and apparatus.
A conductive ink is applied to the carrier by a deposition method such as screen printing.
See also
Any conventional deposition method may be used for depositing the coating.
The present invention relates to a plasma reactor for performing an etching or deposition method.
The chemical vapor deposition method is also used to form active layers.
The observed apparent conductivity type results from the deposition method used.
A stepwise deposition method for preparing a silk biomaterial coating on a substrate is also provided.
The dielectric material used as a wave guide is deposited using a vacuum deposition method.
Ion plating is a vapor deposition method combining vacuum vapor deposition and sputtering.
The metal depositions may for example be performed by a physical vapor deposition method.
The preferred vacuum deposition method for depositing a reflective metal layer is sputtering.
Another method for obtaining polycrystalline silicon is a deposition method making use of a fluidized bed.
This deposition method is very advantageous for depositing dielectrics as a result of its energy character.
Experiments have been performed with a deposition method which would eliminate this negative doping.
A deposition method through a mask having the intended periodic patterns may also be used.
The metal layer may be deposited by any deposition method known from the prior art.
Galvanic deposition method for an anthracite coloured coating and metallic parts provided with the coating.
This layer can be formed by a vacuum vapor deposition method and other suitable deposition methods.
The extraction method used magnetic and amphiphilic carbon nanotubes obtained by chemical vapor deposition method.
Such a chemical vapour deposition method is well known to the man skilled in the art.
The bifunctional catalysts were prepared by co-precipitation deposition method.
Substrates coated by the deposition method of the present invention may have various utilities.
As another catalyst coating method, a vapor deposition method is suggested.
Both the coatings and their deposition method are recent innovations invented in our research group.
Preferably, said deposited layer is obtained using a dry deposition method.
The deposition method may be other like hotwire CVD.
In that respect, the employment of a vacuum deposition method is most preferable.
Vapour deposition method for preparing amorphous lithium-containing compounds.
According to the invention, the deposition method comprises two successive steps,.
Vapor deposition method for depositing a film of fluorine-containing glass on a substrate.
The present invention relates to a deposition method for ink-jet printing.
The centrifugal deposition method is preferable, because it requires little treating solution.
Reconstructing said mounting flange by a hard surface deposition method according to claim 1 ;.
CVD refers to a vacuum deposition method for thin films starting from gas precursors.
In particular, the stacking process may be performed by a solution process or a deposition method.
Thus, such a deposition method is quick to perform.
The formation of the wall 74 is effected by the deposition method as described above.
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