Examples of 'electron-beam' in a sentence
Meaning of "electron-beam"
Electron beam refers to a narrow beam of electrons that are accelerated in a vacuum usually to very high speeds and used in various technological applications
How to use "electron-beam" in a sentence
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electron-beam
Some examples are sterilized vía electron-beam sterilization.
Electron-beam sterilization techniques are known.
Some embodiments are sterilized vía electron-beam sterilization.
Electron-beam installation for melting the refractory materials.
The following are examples involving electron-beam treatment.
Method of electron-beam lithography with correction of corner roundings.
Production of a desired resist pattern by ultraviolet or electron-beam lithography ;.
Electron-beam induced optical superresolution in integrated light-electron microscopy.
The present invention applies to the field of electron-beam lithography.
It may be noted that the electron-beam welding machine parameters are preset.
The present invention applies to the domain of electron-beam lithography.
Electron-beam pasteurization of raw oysters may reduce viral food poisoning.
The vapor deposition is initiated vía electron-beam evaporation of the source.
If electron-beam radiation is used for curing, a photoinitiator need not be used.
The designed pattern was then defined using electron-beam lithography.
See also
The electron-beam welding then takes place by means of an electron-beam welding machine.
These films are designed to be metallized by thermal or electron-beam evaporation of aluminum.
In one embodiment, electron-beam evaporation is used to form the multilayer structure on the support.
Device for control of the evaporation process in the electron-beam installation.
Such crosslinking may be achieved by electron-beam irradiation or by chemical crosslinking of the implant.
In a second operating mode, an insert is welded by means of an electron-beam welding machine.
In addition to electron-beam irradiation, crosslinking can also be effected by UV irradiation.
A sterilization process can be performed by electron-beam irradiation or gamma-ray irradiation.
A wide array of pharmaceutical products is currently sterilized using various radiation and electron-beam sources.
The silicone composition may be cured by electron-beam radiant energy, ultraviolet energy or heat.
A pattern consisting of a network of holes is imaged in the resin by electron-beam lithography.
The polymer of preference is an electron-beam cross-linked PEO available commercially as a wound dressing.
All filters and monolayers were deposited by ion-assisted electron-beam evaporation technique.
Up to 3 electron-beam evaporation sources for simultaneous operation.
There are also solventless inks which can be cured by UV and electron-beam radiation.
However, electron-beam irradiation is preferred.
Silicon layer 13 is deposited by continued electron-beam evaporation.
Electron-beam deflection system.
This is the basis of electron-beam direct-write lithography.
Electron-beam transmission efficiency.
Either gamma-irradiation or electron-beam irradiation can be used.
Electron-beam installation for the high-melting materials melting.
Sterilising means which comprise an electron-beam emitter, and.
The electron-beam activation of the reaction gas molecules ensures,.
Once assembled, the parts are laser or electron-beam welded.
The electron-beam irradiation source can be any suitable electron-beam generator.
Preferably, the welding is laser welding or electron-beam welding.
As a source of electrons for electron-beam welders, the material must fulfill certain requirements,.
The welding process is a welding process of the electron-beam type ;.
Electron-beam radiation has not been applied for sterilization of devices such as ultrasound catheter 10.
Means of sterilising which comprise an electron-beam emitter and / or.
However, currently, electron-beam CT represents an outdated and virtually unavailable diagnostic modality.
Such a welding technique is, for example, electron-beam welding or laser welding.
Electron-beam lithography ( EBL ) is a method of etching semiconductors at resolutions smaller than a micrometer.
In addition to photolithography . x-ray and electron-beam lithography have found analogous use.
