Examples of 'hard mask' in a sentence
Meaning of "hard mask"
hard mask -a protective covering, typically made of a tough material, that is worn to protect the face or head from injury or infection. It is used in various industries, such as construction, manufacturing, and healthcare, as well as in sports and military operations
How to use "hard mask" in a sentence
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hard mask
Integrated circuit process using a hard mask.
The hard mask is consumed after each etching.
A resin layer is then deposited on the hard mask.
A hard mask is normally an inorganic mask.
The cream then turns into a hard mask.
Hard mask of the second stack.
Eliminating the hard mask.
The hard mask may be removed after this control.
It is conventionally referred to as a hard mask.
A hard mask partly covers at least the underlying layers.
Elimination of the hard mask.
The hard mask is inorganic.
The mask is a hard mask.
The hard mask is for example made of SiOx or SiNx.
According to an embodiment the masking layer is a layer forming a hard mask.
See also
The first hard mask is formed by etching a layer of hard material.
Similar results may be obtained using a hard mask instead of a resist mask.
The hard mask can also be of the SixOy or SiOx type.
The oxidised layer of the gate flank is protected by the hard mask.
A hard mask made from organic resist may also be envisaged.
The is for example performed by using a plasma etching through a hard mask.
The hard mask and the layer to be etched are modified as above.
Said mask can advantageously include a resin mask and a hard mask stacked.
This hard mask could also be made of titanium or silicon nitride.
The gate is thus encapsulated between the spacer and the hard mask.
Optionally a hard mask or photoresist can be used to protect the passivation.
The pattern in the resin thus no longer needs to be transferred into a hard mask.
The hard mask can be formed by etching a layer of hard mask material.
The resin and the optional hard mask are eliminated at the end of this step.
The hard mask patterning process remains the main contributor for gate roughening.
Thus no other layer covers the hard mask made from silicon during etching.
The hard mask and front grid spacers are not necessarily in the same material.
According to one possible implementation the hard mask may have a constant transverse section.
The hard mask is disposed between the resist mask and the layer to be etched.
The last challenge is the control of the hard mask consumption or the spacer height.
Chemical mechanical polishing of the second metallic layer with a stop on the hard mask.
The stack of layers further comprises a hard mask on the top of the insulating layer.
The pattern is then transferred into the polysilicon using the dielectric as a hard mask.
Formation of a hard mask by transfer of the patterns ;.
Step of removing the fifth resist mask before step h of removing the second hard mask.
The hard mask is patterned so as to form etching mask 8.
The patterned dielectric layer with spacers acts as an oxide hard mask for the etching.
Hard mask is first deposited on the thin silicon layer 9.
According to an alternative embodiment, the mask is a hard mask.
Advantageously, the intermediate hard mask is made from an oxide.
This hard mask can be made of silica, titanium or silicon nitride.
Second etching mask 6 is also called hard mask.
However, spacers and a hard mask in silicon oxide can be considered.
Fabricate a mechanical support layer on the hard mask layer ;.
Hard mask denotes a mask resistant to engraving, typically to plasma engraving.
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