Examples of 'insulator layer' in a sentence
Meaning of "insulator layer"
insulator layer ~ a layer or material that serves as an insulator, which is designed to prevent the transfer of heat, electricity, or sound between two objects or environments
How to use "insulator layer" in a sentence
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insulator layer
The insulator layer then becomes resistive.
Depositing a conductor layer on the insulator layer.
The thermal conductivity of the insulator layer is measured using transient thermoreflectance.
The method of the invention then provides a lattice of silicon microvolumes on an insulator layer.
Step c may leave a first insulator layer on the surface.
This insulator layer may be formed by thermal oxidation of the silicon substrate.
The active silicon layers surmount an insulator layer placed above a ground plane.
The first insulator layer is preferably a layer in accordance with the topology of the substrate.
The active layers of silicon surmount an insulator layer made above a ground plane.
An insulator layer is interposed between each end plate and the adjacent end electrode.
This layer remains integral with the target substrate via the insulator layer.
It is going to form the insulator layer of the future SOL substrate.
The insulator layer in FD devices is significantly thinner than the channel depletion width.
The formation of an insulator layer on a silicon substrate ;.
The encapsulant may be a poorly-conducting insulator layer.
See also
The deposition of an insulator layer to protect the electrodes ;.
Process according to claim 7, wherein the superficial insulator layer is an oxide.
The buried insulator layer 3 forms an etch stop layer.
The electrosurgical blade of claim 1, wherein the insulator layer comprises glass.
An etch stop insulator layer 8 is formed above each interconnection level.
Often, the second metal is etched while a thin insulator layer has been deposited.
The gate insulator layer is comprised of silicon oxide, for example.
An optional current collector, and any final insulator layer may then be applied in order.
The buried insulator layer 9 forms a stop layer for this etching.
The sacrificial layer 7 is then the insulator layer of the SOL substrate.
The gate insulator layer 44 a is also represented therein.
The removal of the left-over portion of the insulator layer deposited initially on the substrate.
The insulator layer is thinned, and.
One covers it with a sacrificial insulator layer 7 that may be in silicon oxide.
The insulator layer 70 can be formed of a paper or other fibrous material, such as a cellulose.
Removing a substrate and an insulator layer of the first silicon wafer ;.
The superconducting electrical cable system of claim 49 wherein the encapsulant is a poorly-conducting insulator layer.
Depositing an electric insulator layer at least on the resistive elements ; and.
A metal layer 3 is deposited on the insulator layer 2.
The substrate may include an insulator layer ( eg a silicon dioxide insulating layer ).
In a SOL substrate the etching of chamber 55 stops at the insulator layer.
Making at least one aperture in the insulator layer above the layer of amorphous silicon ;.
The cryogenically-cooled HTS wire of claim 12 wherein the encapsulant is a poorly-conducting insulator layer.
A 30 nm thickness of the insulator layer proves to be appropriate.
An insulator layer 123 is arranged above the transistors.
One stops the etching as soon as fragments of the insulator layer 202 are laid bare.
In a step 705, a gate insulator layer is formed so as to cover the semiconductor element.
Another method comprises creating, on a single-crystal silicon wafer, an insulator layer provided with an opening.
Removing a substrate and an insulator layer of the second silicon-on-insulator wafer ; and.
The medium comprises, in particular, electric insulator layer 20.
If the gate has an insulator layer 6, the ohmic contact 5 may be made of gold.
The SOI substrate successively comprises a support layer 1, a buried insulator layer 2 and a semi-conducting layer 3.
A portion of the insulator layer 12, also gets etched when an isotropie etch is used.
Membrane with an electric insulator layer Rb ( KΩ ).
The insulator layer 15 is perforated by a die-cutting process to provide apertures 17.
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