Examples of 'ion beam' in a sentence
Meaning of "ion beam"
An ion beam is a stream or beam of charged particles, typically ions, that is created and manipulated for various purposes in scientific research, industry, or other applications. It is often used in fields such as material science, nanotechnology, and particle physics to study, manipulate, or modify materials at the atomic or molecular level
How to use "ion beam" in a sentence
Basic
Advanced
ion beam
Heidelberg ion beam therapy center hit.
In both cases electrons are needed to generate an ion beam.
Ion beam trimming of silicon dioxide thin films.
Bombardment is advantageously performed in step b by means of an ion beam.
An ion beam can also be used.
Chemical analysis with the ion beam microprobe.
This ion beam is preferably a beam of argon ions.
Device for generating an ion beam.
A third ion beam source is optional.
A flexible energy filter for ion beam therapy.
An ion beam is a type of charged particle beam consisting of ions.
The films were obliquely irradiated with an ion beam.
Ion beam spectrochemical analysis.
Method and apparatus for ion beam transport.
Ion beam induced deposition.
See also
Macroscopic doping by pulsed ion beam presents two variants.
Ion beam milling is used in order to mitigate this problem.
The characteristics of the ion beam are very evidently important.
The ion beam treatment utilizes at least oxygen ions.
Fibx custommultiple output powersupply for focused ion beam.
Light ion beam fusion.
Debris removal by ion beam.
Other layers may be ion beam treated in a similar manner.
This is prejudicial to the production of an intense negative ion beam.
The insulator is coupled to the ion beam source housing.
Ion beam initialized.
Vintage wine bottles authenticated by high energy ion beam.
Ion beam cluster.
This end is therefore treated only by bombardment by an ion beam.
It is possible to modulate the ion beam at the time of its formation.
Device for measuring an ion current produced by an ion beam.
By ion beam sputtering.
The sample may be machined using an ion beam technique.
Physics of the ion beam of charged particle beams and accelerator.
The target system receives the accelerated ion beam.
By ion beam atomisation.
These nuclei are studied shortly after their formation in an ion beam.
Ion beam etching may be performed using any suitable ions.
One or multiple such ion beam source devices may be used.
Semiconductor thin sections can be made using a focused ion beam.
Focussed ion beam.
Their centers are placed level with a constriction in the ion beam.
Ion beam synthesis allows a control of the nanocrystals amount and size.
Ion implantation equipment can be used to achieve ion beam mixing.
Improved ion beam processing and imaging using a plasma ion source.
It is advantageous to systematically alternate sequential deposition and ion beam treatments.
Ion beam techniques permitted to check periodicity and composition of the multilayers.
By atomizing by an ion beam.
One or more ion beams may be used in the ion beam treatment.
This makes it possible to prevent irradiation with an unnecessary ion beam.
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