Examples of 'layer of silicon' in a sentence

Meaning of "layer of silicon"

layer of silicon: This phrase refers to a coating or level of silicon material, often used in the context of technology, such as semiconductors or electronic components

How to use "layer of silicon" in a sentence

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layer of silicon
This dielectric can be a layer of silicon oxide.
Layer of silicon carbide sandwiched between two layers of pyrolytic carbon.
Device for depositing a layer of silicon on a carbon tape.
A layer of silicon nitride is deposited on the surface of the photovoltaic cells.
The protective layer is preferentially a layer of silicon nitride.
Sufficiently doped layer of silicon could be used for example.
The wafer may be covered again with a layer of silicon oxide.
The bundle rests on a layer of silicon dioxide formed on a silicon substrate.
Each multilayer is formed from a layer of molybdenum and a layer of silicon.
Adding a thin passivating layer of silicon dioxide could reduce recombination.
This etching is propagated concentrically beneath the upper layer of silicon.
Some ignition modules require a layer of silicon grease during installation.
One layer of silicon is treated with a substance to create an excess of electrons.
The metal silicide is at a distance from the layer of silicon nitride.
Depositing a second layer of silicon oxide adjacent said first layer.

See also

This intermediate layer may for example be a layer of silicon oxide.
A thin layer of silicon doped with boron is deposited on a metal base.
The specified layer may be a layer of silicon heavily doped with boron.
It is therefore possible to make silicon nanocrystals covered with a layer of silicon nitride.
The thin layer of silicon is locally freed from the underlying layer.
The superficial oxidation of the silicium to obtain a thin layer of silicon dioxide.
Onto the layer of silicon dioxide is deposited a double layer of aluminium alloy material.
The layer in contact with the glass is for example a layer of silicon oxycarbide.
The layer of silicon oxide may be removed without any etching of the subjacent silicon.
The method considerably reduces the probability of fractures forming in the layer of silicon.
Multilayer material comprising a film carrying layer of silicon oxide and a polyolefin film.
Whereby a layer of silicon oxide having improved step coverage is deposited onto the wafer.
The entire preparation on the glass slide was covered with a thin layer of silicon rubber.
The layer of silicon above the tunnel has a perfect monocrystalline structure and uniform thickness.
It used crystalline silicon for the semiconductor and a thermally oxidized layer of silicon dioxide.
This method uses a layer of silicon oxide to bond the transferred layer onto a host substrate.
Between the aluminum top and the silicon bottom is a very thin layer of silicon dioxide.
This step forms a insoluble layer of silicon dioxide over the first layer of sodium silicate.
The described embodiment requires a separation method for forming the thin surface layer of silicon.
This additional layer of silicon may be deposited in particular by a PECVD type technique.
Or a layer of an organic dielectric BCB over a layer of silicon oxide.
The layer of silicon situated above the layer of BOX therefore has variations in thickness.
The resin remaining on the layer of silicon I is eliminated.
The layer of silicon disposed above the layer of BOX then also has different thicknesses.
Depositing the first layer of silicon oxide ;.
A layer of silicon oxyde 8 is then deposited on the epitaxial layers.
Step of depositing a layer of silicon oxide ;.
A layer of silicon nitride and a layer of silicon oxide are deposited successively ;.
Step of levelling the layer of silicon oxide by polishing ;.
The layer used as spacer 4 in the catalytic stack is a layer of silicon.
Depositing a fourth layer of silicon nitride ;.
To do this, a layer of silicon nitride is deposited on the structure obtained previously.
Advantageously, the protective layer is a layer of silicon nitride.
Depositing a layer of silicon on the surface of the substrate ; and.
The nitride-based layer is preferably a layer of silicon nitride.

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