Examples of 'material is silicon' in a sentence
Meaning of "material is silicon"
material is silicon: Indicates that a substance or element being discussed is composed primarily of silicon, a chemical element commonly used in manufacturing electronic devices, solar panels, and other industrial applications
How to use "material is silicon" in a sentence
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material is silicon
The preferred powder material is silicon carbide.
The material is silicon dioxide.
The most important semiconductor material is silicon.
A common material is silicon.
The most commonly used semiconductor material is silicon.
The first material is silicon.
The most frequently used basic semiconductor material is silicon.
Preferred material is silicon.
The substrate generally consists of silicon and the isolating material is silicon oxide.
The most common inorganic dielectric material is silicon dioxide commonly used in integrated chips.
Many materials have semiconductor property but the most widely used material is silicon.
A preferred protective coating material is silicon dioxide or silicon monoxide and possibly aluminum oxide.
Preferentially, the semiconductor material is silicon.
Typically, the material is silicon dioxide or silicon nitride.
An example of a suitable ceramic material is silicon carbide.
See also
Preferred blanket material is silicon rubber ; preferably reinforced with fabric, such as fiberglass.
A suitable adhesion-promoting material is silicon monoxide.
Advantageously, the first semiconducting material is germanium and the second semiconducting material is silicon.
Preferably, the ceramic material is silicon carbide SiC.
The microcomponent according to claim 9, wherein the semiconductor material is silicon.
Said first semiconductor material is silicon and said coating step is a siliconizing step ;.
Advantageously, said semiconductor material is silicon.
As an example, the temporary material is silicon and said first material is silica SiO 2.
According to an embodiment, the dielectric material is silicon oxide.
A preferred dielectric core material is silicon dioxide or polystyrene ( preferably containing sulfate groups ).
Advantageously, the semiconductor material is silicon.
Also advantageously, the third semiconducting material is germanium and the fourth semiconducting material is silicon.
Burner according to claim 2, wherein the ceramic material is silicon nitride or silicon carbide.
A closed-system container according to Claim 14 wherein said low friction, low mass material is silicon.
Preferably, the material is silicon.
The first material is for example silicon-germanium and the second material is silicon.
A preferred non-sticking material is silicon rubber, for example.
According to an embodiment of the present invention, the insulating material is silicon nitride.
The most efficient masking material is silicon nitride Si3 N4.
Method according to claim 1, wherein said semiconductor material is silicon.
For example, here, the material is silicon.
Device according to claim 2, wherein the semiconductor material is silicon.
According to an embodiment, the insulating material is silicon oxide.
Method according to claim 1, characterized in that said material is silicon.
According to an embodiment, the first dielectric material is silicon nitride.
A device according to claim 13, wherein said polycrystalline semiconductor material is silicon.
The method of claim 9 wherein said material is silicon dioxide.
Process according to claim 12, characterized in that the semiconductor material is silicon.
A method as claimed in claim 3 in which the ceramic material is silicon carbide.
A radiator according to claim 12, wherein the optically active material is silicon.
The method of claim 1, wherein the diffusion barrier material is silicon dioxide.
A method according to claim 12 characterized in that the semi-conducting material is silicon.
The plasmonic filter of claim 1, wherein the dielectric material is silicon nitride.
FIG . 14 represents an application of the invention, when the semiconductor material is silicon.
The apparatus according to claim 1, wherein the second material is silicon dioxide.
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