Examples of 'plasma etching' in a sentence
Meaning of "plasma etching"
Plasma etching: A process used in manufacturing and microfabrication to selectively remove material from a surface using plasma, typically in the development of electronic devices
How to use "plasma etching" in a sentence
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plasma etching
One example of plasma etching is shown here.
Plasma etching of the substrate tube itself.
The preferred form of etching is plasma etching.
Deep plasma etching is included in these methods.
Oxygen is the preferred plasma etching gas.
Plasma etching method and plasma etching apparatus.
This etching can be plasma etching for example.
Dry plasma etching is known for this purpose.
Or then by a chemical or plasma etching method.
The plasma etching is intended to remove alloy material.
It is possible to perform chemical etching or dry plasma etching.
Plasma etching makes it possible to obtain such a structure.
This excess can be removed by mechanical or plasma etching.
Plasma etching may be used as an alternative to acid cleaning.
Other disadvantages are entailed in plasma etching.
See also
Or plasma etching or laser ablation which have been referred to.
That may be done chemically or by plasma etching.
Plasma etching and deposition.
This dimension is reduced in the plasma etching step.
In piece of plasma etching equipment.
Alternatively the groove may be formed by plasma etching.
Plasma etching offers an excellent method for this cleaning.
These processes include various plasma etching processes.
Plasma etching is indeed much more aggressive due to the bombardment.
It is preferably a plasma etching process.
The first conductive layer is etched by reactive plasma etching.
Si nanowires are obtained by plasma etching then thinned by sacrificial wet oxidation.
These metallised areas are defined by chemical or plasma etching processes.
The technique used may be plasma etching or photo ablation by excimer laser.
The shape of the resonator is then defined by plasma etching.
Plasma etching involves some of the most complex chemistry used in manufacturing today.
A process and device for plasma etching a thin layer.
Polysilicon areas not protected by the resin are eliminated by plasma etching.
The surface may also be cleaned by plasma etching in an oxygen atmosphere.
The membrane formation step may be carried out by plasma etching.
This oxygen plasma etching process should be performed immediately prior to adhering the receptive material.
High resolution plasma etching.
The development of the simulator is based on the fundamental concepts in plasma etching.
Interconnect holes were produced using the plasma etching process described above.
Plasma etching and corona discharge provide markedly superior flow control characteristics and reproducibility.
The etching means can comprise a plasma etching device.
O 2 plasma etching may be done for this purpose.
This removal can be carried out via plasma etching.
TMAH or plasma etching.
This method combines a depositing method and plasma etching.
Thus, plasma etching can be replaced by dry etching.
This is also called a plasma polishing or plasma etching phase.
Particularly, a plasma etching is implemented.
It does not matter whether these materials are resistant to plasma etching or not.
It is possible to perform plasma etching and / or wet process etching.
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Etching of plastic substrates prior to their metalization
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Etching of plastic substrates prior to their metallization
