Examples of 'plasma processing' in a sentence
Meaning of "plasma processing"
Plasma Processing: The technique of using plasma for various industrial or scientific processes, such as materials treatment or energy generation
How to use "plasma processing" in a sentence
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plasma processing
In general this process is called plasma processing.
Plasma processing to improve adhesion between the layers.
Apparatus for large área plasma processing.
Plasma processing apparatus with an electrically conductive wall.
Reactor for the plasma processing of gaseous media.
Plasma processing apparatus and method.
The present invention relates to a plasma processing reactor.
Plasma processing technologies are successfully employed for polymers surface functionalization.
There is included a substrate holder disposed within the plasma processing chamber.
Process chamber for plasma processing and apparatus employing said process chamber.
Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber.
A gas is introduced into a vacuum plasma processing chamber where the workpiece is located.
Plasma processing for larger objects has been used primarily for plastic substrates.
There is further included an observation window disposed on a surface of the plasma processing chamber.
Many plasma processing procedures also employ filtration through relatively fine filtration media.
See also
The focus ring assembly is configured to substantially encircle a chuck of the plasma processing chamber.
A laser processing head and a plasma processing head can be connected to a single shaft element.
Plasma generating apparatus and method of manufacturing patterned devices using spatially resolved plasma processing.
These obstacles with plasma processing proclude it from being a competitive surface modification method within industry.
This can be an advantage for inside tube plasma processing H.
A conventional plasma processing apparatus such as described above has several problems such as the following.
In a preferable embodiment, argon and / or oxygen is used for the plasma processing.
The plasma processing system includes a chuck configured to support the substrate during plasma processing.
This object is solved by the plasma processing reactor of independent claim 1.
The plasma processing chamber includes a first electrode disposed outside the plasma processing chamber.
Other options include ultrasonic welding, resistance welding, and plasma processing.
This is obtained by a plasma processing apparatus according to claim 1.
More particularly, the grids may be processed according to plasma processing technology.
A plasma processing apparatus comprising,.
In another embodiment, the invention relates to a plasma processing chamber configured to process a substrate.
The plasma processing apparatus of claim 8 in which the rings are of a dielectric material.
The case is made of a solid block of white ceramic, with a plasma processing technique.
The plasma processing chamber of claim 15 wherein said second material is sapphire.
High-vacuum pumps typically operate at pressures below those for plasma processing.
The plasma processing apparatus of claim 1 wherein the confinement assembly comprises a dielectric.
The samples were transferred on ice to the laboratory for plasma processing within 30 minutes.
Two partners operate plasma processing setups, one at lab scale and one at industrial scale.
Manufacturing microarrays of gradient chemical activity at the micron scale using plasma processing technology ;.
The plasma processing system of any preceding claim wherein said control circuit further comprising,.
Method of manufacturing patterned devices using spatially resolved plasma processing comprising the steps of,.
The critical role of plasma processing technology in industry is illustrated in Chapter 2.
Plasmas have many technological applications, from fluorescent lighting to plasma processing for semiconductor manufacture.
A window of a plasma processing chamber, comprising,.
Product treatment, According the set time in program to starting plasma processing.
In yet another embodiment, the invention relates to a plasma processing chamber configured for processing substrates.
Preferably, the DC biased mask avoids touching the surface under patterned plasma processing.
The diagram of potential distribution in RAAD plasma processing is illustrated in Figure 6.
A plasma processing chamber configured for processing substrates, comprising,.
Fig . 1 illustrates a representative plasma processing chamber.
Vacuum plasma processing chamber 10 is supplied with a gas from a suitable source ( not shown ).
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Examples of using Processing
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Timely processing of travel requests and arrangements
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