Examples of 'resin mask' in a sentence
Meaning of "resin mask"
resin mask: A facial covering or disguise made from resin, a type of material often used in crafts and manufacturing
How to use "resin mask" in a sentence
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resin mask
Said mask can include a resin mask.
The resin mask is then eliminated.
The etchings are produced by using a photosensitive resin mask.
This resin mask is produced by conventional photolithography methods.
The surface is stripped to remove the resin mask.
A resin mask is then formed using a conventional photolithographic process.
The removal of said resin mask.
Said resin mask is removed.
This is followed by the elimination of the resin mask by chemical dissolving.
A resin mask defined by photolithography is used for this purpose.
This is a resin mask.
The resin mask 4 may then be removed or not.
Tests with irradiation through a resin mask were also carried out.
The resin mask 6a is then eliminated by an oxygen plasma.
It is possible to use reactive ionic etching with a resin mask defined by photolithography.
See also
The cured PVC resin mask is then stripped from the vehicle flange.
Said mask can advantageously include a resin mask and a hard mask stacked.
The thus obtained resin mask 6a represents the image of the pattern to be produced.
Due to the formation of these polymers, the resin mask is very difficult to remove.
This resin mask thus takes the shape desired for the waveguide, seen from above.
The formation of a photoresist resin mask on the layer of insulation material ;.
A particularly suitable method is RIE ( Reactive Ion Etching ) through a resin mask.
The resin mask 56 is then dissolved with acetone.
Furthermore, an integration of the block copolymer directly in a resin mask may also be envisaged.
Finally, the resin mask is removed.
It also makes it possible to eliminate resin mask 12a.
The resin mask 38 is then eliminated by an oxygen plasma.
It also makes it possible to partly eliminate the resin mask 55.
Mask 6 is e.g. a resin mask obtained according to conventional photolithography processes.
As an example, opening 56 may be formed by lithography by means of a resin mask.
Openings are formed in the resin mask in front of pixel isolation regions 28.
The resin mask 75 can be removed either chemically or by oxygen plasma attack.
To produce the rib of the waveguide, a resin mask 32 is made by lithography.
This resin mask is removed following the p+ implantation of the layer 8.
This is followed by the elimination of the resin mask 13 by oxygen plasma.
The resin mask 11b is removed, for example using acetone and then nitric acid.
For example, this can be obtained by depositing a resin mask on the substrate 51.
The resin mask is then eliminated as shown in FIG . 9C.
The first etching step is then performed through the resin mask 904.
The resin mask 133 may be made by photolithography.
The free face of the layer 13 is provided with a resin mask by photo-lithography.
Resin mask 32 is then eliminated chemically.
Next, anisotropic etching of the protective layer 209 protected by the resin mask is performed.
Finally, the resin mask 126 is eliminated by an oxygen plasma.
Holographic exposure and development produce the resin mask 7 shown in FIG . 6.
This thus forms a resin mask 13 located on the reservoir layer 12.
FIG . 9 J ′ shows the result obtained after elimination of the resin mask.
Photosensitive resin mask 164, which is required to obtain the patterns, is then formed.
FIG . 9J shows the structure obtained after elimination of the resin mask.
Photosensitive resin mask 158 that is necessary to obtain the patterns, is then formed.
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