Examples of 'resist layer' in a sentence
Meaning of "resist layer"
A resist layer refers to a thin coating applied to a surface to provide protection or prevent damage, typically in manufacturing processes such as lithography or etching
How to use "resist layer" in a sentence
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resist layer
A resist layer is deposited and lithographically patterned.
This delay is sufficient to remove the resist layer.
The resist layer is located on a workpiece.
The remaining patterned resist layer is then stripped off.
Developing the pattern by sprinkling of a developer on sacrificial resist layer.
Removing the second resist layer remaining after step o.
The resist layer is located on a top major surface of the workpiece.
The mask forming generally uses the deposition of a resist layer.
The resist layer is developed.
Other materials or chemicals may be used to form the resist layer.
The etch resist layer preferably consists of polyvinyl chloride.
Etching the portions of the second resist layer illuminated at steps r and s.
This resist layer is patterned by a sequence of at least a lithographic and a development step.
Preferably the positioning mark forms a hollow relief in the resist layer.
The solder resist layer was observed after peeling test.
See also
Chemical and physical changes occur in the exposed areas of the resist layer.
The patterning of the resist layer is in its turn done with molecular stamps.
Measurement of the reflectivity of the layer to be etched present below the resist layer.
Such selective curing and removal of a resist layer may be accomplished by known photographic techniques.
That has the advantage of generating positioning marks by simple embossing of the resist layer.
The reason that the solder resist layer can have a matte surface is considered as follows.
Consequently, heat resistance of the solder resist layer is improved.
Thickness of a resist layer on the wafer ; and.
A resist layer is deposited in the bottom of said cavity ;.
Accordingly, the solder resist layer can be formed.
Forming a resist layer on top of the regions not to be silicided ;.
Measurement of a thickness of a resist layer on said wafer ; and.
Exposing the resist layer to a radiation to define the connection elements ;.
Therefore, adhesiveness of the solder resist layer can be improved.
Depositing a resist layer at the bottom of said cavity ;.
Accordingly, surface evenness of the solder resist layer is improved.
A, the solder resist layer did not have cracks.
C, there was no luster on the surface of the solder resist layer.
In one embodiment, the resist layer is formed of inorganic materials.
As a result, a test piece including the solder resist layer was obtained.
Etching the first resist layer across a first thickness by photolithography ;.
Alternatively, the positioning mark forms a projecting relief in the resist layer.
Accordingly, the solder resist layer has an improved smoothness.
B, there was a slight decrease in luster on the surface of the solder resist layer.
As a result, the solder resist layer tends not to discolor.
A material sensitive to light, such as ultraviolet light, is used as the resist layer.
Removing the first resist layer remaining after step e ; and.
In the example given hereinabove, the silicon wafer is coated with a resist layer.
Partially illuminating the second resist layer across a fourth thickness ;.
The resist layer 3 is developed in a known manner, for example using a dissolution bath.
The etching is preferably a step of developing resist layer 46 of a photolithography method.
Particularly advantageously, the positioning marks are generated and are detected in the resist layer.
In these cases, coloring of the solder resist layer is further prevented.
The second decorative ply 7 comprises at least one second photoactivatable resist layer.
Depositing a new resist layer extending beyond the layers already etched ;.
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