Examples of 'second insulating layer' in a sentence
Meaning of "second insulating layer"
Second insulating layer is an additional protective coating or barrier, usually applied on top of an initial layer to further enhance insulation properties
How to use "second insulating layer" in a sentence
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second insulating layer
Removing the second insulating layer on the peaks.
Second conducting layer arranged on the second insulating layer.
Water being trapped in the second insulating layer is conducted away through the envelope.
Forming a metal layer in the recess against the second insulating layer.
This step and the second insulating layer etching step may be performed simultaneously.
The first conductive layer may also extend on the second insulating layer.
A second insulating layer covers the conductor except in a region that defines the electrode opening.
Second way of etching the second insulating layer is as follows.
The second face of said substrate preferably also includes a second insulating layer.
After assembly in step c the second insulating layer could be removed.
The second insulating layer 4 may also be absent.
The periphery of the electrodes remains covered and protected by the second insulating layer 8.
Depositing a second insulating layer on the epitaxied layer ;.
The uncured resin material of this case is a material for forming a second insulating layer 26b.
Deposition of a second insulating layer on the structure obtained ;.
See also
Positioning a patterned spacer layer between a first insulating layer and a second insulating layer such that,.
First way of etching the second insulating layer would be as follows,.
A second insulating layer disposed above the first insulating layer ;.
Opening locally a window in said second insulating layer at the bottom of said recessed zones ;.
Second insulating layer 5.
The second semi-conductor layer is arranged on a second insulating layer stacked on a second conductive layer.
Lastly, the second insulating layer is etched until the aforesaid cavities are obtained.
Three openings 5 are provided in the second insulating layer 4.
Depositing a second insulating layer on said metallic thin layer ; and.
In this embodiment, a conducting layer 16 is arranged on the second insulating layer.
Forming a second insulating layer having a top surface on said upper magnetic layer ;.
Preferably, the first insulating layer and / or the second insulating layer is / are provided as a tape.
Covering the second insulating layer and the contacts with a second photosensitive layer ;.
Still another option is to form a second conductor layer 56 directly over the second insulating layer 48.
Producing a second insulating layer in the second window and on the first amorphous semiconductor layer ;.
Afterwards, conductive tracks 14 are manufactured before depositing a second insulating layer 11.
The insulating layer 16 cnonstitutes the second insulating layer of the method according to the invention.
Second insulating layer 5 is in contact with the sheet 3 which acts as a support.
In other words, the first and / or second insulating layer covers the conductive strip, e . g.
A second insulating layer 29 is deposited on the assembly before depositing another magnetic layer 30.
Process according to claim 23, wherein, after assembly, the second insulating layer is removed.
Depositing a second insulating layer and carrying out chemical-mechanical polishing of the second insulating layer ;.
The bus bar 1 comprises a first insulating layer 2, a conducting strip 3 and a second insulating layer 4.
Thus, second insulating layer 8 is removed very quickly.
The bias magnetic field coil 21 made of Al is buried in the second insulating layer 10c.
An opening in second insulating layer 3 enables accessing electrode 10.
Second insulating layer 19 is a layer of SiO2, for example, deposited on polarization layer CP5.
Depositing a second insulating layer on said lower polar part ( PPI ) ;.
A second insulating layer 82 is then arranged around the outside of the layer of conductive material 78.
As represented in FIG . 3, a second insulating layer 8 can be formed above the conducting line 6.
This second insulating layer 15 can be, for example, silicon nitride.
In step e, a second insulating layer 8 is deposited at a low temperature on the metal layer 17.
A second insulating layer 30 includes a second array of miniature waveguides 31a to 31n, also having metallized walls.
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