Examples of 'selective etching' in a sentence
Meaning of "selective etching"
selective etching: This term is often used in the context of art or manufacturing processes, where only specific areas are etched or treated
How to use "selective etching" in a sentence
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selective etching
This etching is not necessarily a selective etching.
However selective etching is difficult to achieve.
The openings may be formed by selective etching.
Second step of selective etching by a plasma comprising oxygen.
Surface treatment after selective etching.
The selective etching is carried out by wet method.
Waveguide obtained by selective etching method.
Selective etching of the second dielectric.
The recess can be formed by a selective etching process.
Selective etching of the doped zones of the first coating.
A first function is to authorize selective etching relative to the silicon.
Selective etching of the evaporated metal separates the different sensors.
This is reasonalbe so far as the selective etching only is concerned.
The selective etching of the cylinders leads to a mask of holes in a polymer matrix.
The second material may be removed using selective etching.
See also
Partial and selective etching of one or more layers of the stack.
This thickness is at least partially preserved during the selective etching.
It is also easier to find selective etching than selective epitaxy without crystallographic facets.
Similar results are expected to be obtained with selective etching of the extensions.
And selective etching of said area via a free surface of said first layer.
This removal may be carried out by selective etching of the gate material.
The protective layer may then be based on a material resistant to said selective etching.
It is therefore unnecessary to carry out a selective etching step along the stress fields.
A first selective etching operation is carried out via the openings in the photosensitive resin.
The Optothermal treatment allowed the selective etching on the ABS surface using low power lasers.
The selective etching of the porous monocrystalline silicon layer proceeds by the following etching mechanism.
TECHNICAL FIELD The present invention concerns a selective etching process of a mask deposited on a substrate.
The second selective etching step preferably affects the layers C k and leaves the other layers intact.
Selective interaction of radicals causes selective etching of polymer-matrix composites.
The selective etching is carried out using a plasma ;.
Chemical-mechanical polishing ending elimination with selective etching of silicon on.
This transformation allows a selective etching chemistry to be used with respect to the materials present.
This is also known as non-selective epitaxy combined with selective etching.
The partial and selective etching of the layers of the stack can advantageously be isotropic.
First solution consists in reducing the base-collector capacitance by selective etching.
First step of selective etching with a fluorinated gas plasma ;.
If necessary, the lower protective layer 5 may also be eliminated by selective etching.
This selective etching leads to lift-off of the patterns.
The tunnel will then be produced by selective etching of the dielectric material 5 ′.
Then a selective etching is made of the film 6 over its entire thickness.
This co-etching is undesirable when the selective etching of silicon nitride is required.
In polymers, selective etching is due to polymer fragmentation in the ion track core.
This embodiment may also be obtained by chemical, reactive, selective etching or by ultrasounds.
Next, a second selective etching step of the first type of material is conducted.
Advantageously, these patterns are manufactured by structuring of a simple layer by photolithography and selective etching.
For example purposes, the selective etching can be a dry process etching.
Selective etching of these layers leaves a column with a diameter of about 5 microns.
It will be appreciated that suitable selective etching methods are well-known in the art.
Such a selective etching can enable an inopportune over-etching of the structure to be avoided.
Elimination of said sacrificial layer made of silicon and germanium alloy, by selective etching.
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The measures to reduce documentation were not selective
Pursuing a selective acquisitions and divestments policy
Examples of using Etching
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Etching of plastic substrates prior to their metalization
I will buy an etching for your father
Etching of plastic substrates prior to their metallization