Examples of 'substrate temperature' in a sentence
Meaning of "substrate temperature"
substrate temperature - The temperature of a surface or layer on which a chemical or physical process is taking place, often used in scientific or technical contexts such as in material science or semiconductor manufacturing
How to use "substrate temperature" in a sentence
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substrate temperature
The substrate temperature is at room temperature.
It is necessary to maintain a uniform substrate temperature to obtain uniform film thicknesses.
The substrate temperature was monitored.
The development of aerobic bacteria causes an increase of the substrate temperature.
The substrate temperature is set at room temperature during the deposition.
Body temperature of western toads is closely correlated with the substrate temperature.
A higher substrate temperature allows the growth of a better crystalline quality material.
Aerosol purity also tended to decrease as the substrate temperature during aerosolization was increased.
The substrate temperature can be high enough so that later firing is not needed.
The minimum temperature must comply with both in terms of ambient and substrate temperature.
The influence of the substrate temperature on the deposited coating features has been examined.
The possibility to deposit high quality coatings irrespective of the substrate temperature has been proved.
The pressure and substrate temperature employed controls the morphology of film formation.
The delay time At can be increased with increasing substrate temperature.
A lower substrate temperature can in a similar way be achieved by cooling the working table.
See also
Back-lit image sensor with a uniform substrate temperature.
The substrate temperature therefore can be made low enough to avoid these intermixing effects.
In order to compensate for this, the substrate temperature is elevated.
The substrate temperature during the formation of the transparent electrode layer may appropriately set.
As will be noted, the preferred substrate temperature rises as deposition rate increases.
A substrate temperature which is either too low or too high will adversely affect device efficiency.
Four different ionic-organic nanoarchitectures were engineered varying the substrate temperature.
The substrate temperature was monitored by the thermometer mounted to the holder 37.
Consequently, in the invention, it is not necessary to control the substrate temperature tightly.
Being a key parameter, the substrate temperature has been calibrated with an infrared camera.
This support is connected to a thermocouple 10 permitting the permanent measurement of the substrate temperature.
Incidentally, the substrate temperature can be monitored by mounting a thermometer to the holder.
Heretofore, the art has paid little attention to the parameter of substrate temperature.
To decrease the substrate temperature the different techniques initiating molecules decomposition ( cracking ) have been used.
Essentially, the bias voltages follow rules which are only variable according to the substrate temperature.
The substrate temperature is regulated with the heater, and the temperature is controlled with a thermocouple.
As the fuel / air ratio is increased, the substrate temperature closely matched the adiabatic combustion temperature.
Substrate temperature and oxygen levels were reduced in nonredd substrates 100 cm from redds.
The PdO-Pd transition point establishes the self-limiting substrate temperature for those operating conditions.
The higher the substrate temperature during thin-film deposition, the greater the energy required.
Structure, With its white can reduce the substrate temperature has.
Ambient air and substrate temperature should not drop below -5 C during installation.
It is capable of growing on a culture substrate at a substrate temperature of 32 ° C. or above.
The substrate temperature is measured by an infrared pyrometer ( 6 ).
This self-limiting phenomenon maintains the catalyst substrate temperature substantially below the adiabatic combustion temperature.
The substrate temperature may be as high as 1300 K depending on the material to be deposited.
The hydrogenated amorphous silicon germanium alloys were deposited at a substrate temperature of 220°C.
The CPU 11 discriminates whether the substrate temperature is higher or lower than a predetermined temperature.
The capacitor was typically charged to 11-14 volts, depending on the desired substrate temperature.
Also, in the present device, the substrate temperature can be controlled by the heater portion 59.
Beyond a substrate temperature noted “ Tmax2 ”, the average continuous level is saturated.
When joining membrane sheets together, ambient air and substrate temperature should not drop below -5 C.
Furthermore, the substrate temperature increases with smaller burner-to-lite distances and increasing numbers of passes.
Deposition was carried out using a spray method, and the substrate temperature was held at 500 °C.
Figure 6A-6B illustrates substrate temperature profiles for some exemplary configurations of LEEs on a substrate.
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Examples of using Temperature
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Manufacturer of the separate temperature measuring equipment
Actual temperature below low temperature value
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