Examples of 'anisotropic etching' in a sentence

Meaning of "anisotropic etching"

A process used in microfabrication to create complex three-dimensional structures with high precision by etching materials directionally using an anisotropic etchant

How to use "anisotropic etching" in a sentence

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anisotropic etching
This etching may typically be anisotropic etching.
Anisotropic etching can be performed by reactive ion etching.
The invention allows for a highly anisotropic etching.
Anisotropic etching of the stack through the mask.
The step of stripping comprises preferably anisotropic etching.
Anisotropic etching is also used to etch the grooves.
The apertures are produced by anisotropic etching.
Making an anisotropic etching in the motherboard made of crystalline material.
Once again it is anisotropic etching.
Anisotropic etching of the oxide.
Such an etching method is usually called dry anisotropic etching.
Vertical anisotropic etching.
The etching of the superficial layer is preferably a dry anisotropic etching.
The anisotropic etching is directed in a direction perpendicular to the plane of the substrate.
This hole can also be made by anisotropic etching using a plasma.

See also

An anisotropic etching based on bombarding ions from a fluorinated gas will be used.
The wet etching may be preceded with a partial anisotropic etching.
It is an anisotropic etching.
The other dimension varies according to the depth of the anisotropic etching.
One can also alternate between anisotropic etching and isotropic etching.
A first anisotropic etching is therefore performed in a direction perpendicular to the plane of the substrate.
This step uses photolithography and anisotropic etching of the silicon.
An anisotropic etching thus has a preferential direction in which the material is etched more rapidly.
Such a groove can be conveniently produced using anisotropic etching techniques.
This method comprises an anisotropic etching step followed by an isotropic etching step.
One of the industrial uses of TMAH is for the anisotropic etching of silicon.
Anisotropic etching is advantageously achieved by immersion of the silicon substrate in potassium hydroxide KOH.
Nevertheless this enhancement of extraction efficiency by anisotropic etching technique shows significant improvement.
Then, an anisotropic etching of the silicon is performed.
Channels and cavities can be produced by means of anisotropic etching or plasma etching techniques.
The anisotropic etching is executed using argon or carbon tetrafluoride plasma ;.
The groove by the anisotropic etching shown in FIG.
This work presents experimental investigations on several aspects of anisotropic etching of Si in TMAH.
For example, an anisotropic etching may be carried out.
Highly doped layers have the property not to be etched upon anisotropic etching of Si.
If this substrate is in silicon, anisotropic etching will preferentially be used.
In other words, the step of defining comprises an anisotropic etching.
Then, an anisotropic etching is carried out through any known process.
Dry RIE type etching which allows highly anisotropic etching is used for example.
The anisotropic etching of the grid and the isotropic etching of the insulation ;.
Further, these materials are also inert to an adapted anisotropic etching.
The anisotropic etching and then the selective etching are executed in the same reactor ;.
In carrying out etching, isotropic or anisotropic etching can be used.
This anisotropic etching is carried out over the entire thickness of the silica layer 10.
Release of a part of support substrate 2 is advantageously achieved by means of anisotropic etching.
This is performed by anisotropic etching of the reactive ionic type using a CHF3 plasma.
The abovementioned etching is carried out, of course, by means of an anisotropic etching operation.
This anisotropic etching is identical or similar to the anisotropic etching step of FIG . 2G.
Process according to claim 1, wherein the first etching comprises anisotropic etching.
Anisotropic etching the substrate-mask assembly ; and.

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