Examples of 'chemical vapor deposition' in a sentence
Meaning of "chemical vapor deposition"
Chemical vapor deposition (CVD) is a technique used in materials science and engineering to deposit thin films or coatings onto a substrate. It involves the reaction of precursors in the vapor phase, forming a solid film upon contact with the substrate. CVD is widely used in various industries, including semiconductor manufacturing, aerospace, and surface engineering, to create high-quality coatings with precise control over thickness and composition
How to use "chemical vapor deposition" in a sentence
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Advanced
chemical vapor deposition
Mo is inert in halogen chemical vapor deposition reactions.
Chemical vapor deposition of diamond.
Magnetic confinement chemical vapor deposition.
Chemical vapor deposition is carried out on the two faces.
Low pressure chemical vapor deposition.
The diamond films were deposited on silicon by chemical vapor deposition.
Catalyst chemical vapor deposition apparatus.
A preferred method of coating uses chemical vapor deposition.
Fluidized bed chemical vapor deposition is a preferred method.
The sealing layer can be deposited by chemical vapor deposition.
Fluidized bed chemical vapor deposition is a typical method.
Such coatings can readily be applied by chemical vapor deposition.
Liquid phase chemical vapor deposition is also possible.
Carbon nanostructures and networks produced by chemical vapor deposition.
This can be done by chemical vapor deposition using carbon monoxide.
See also
One use for this type of compounds is in chemical vapor deposition.
Modified chemical vapor deposition.
The process is made use of industrially in combustion chemical vapor deposition.
Metal organic chemical vapor deposition.
Chemical vapor deposition can place a film of a ceramic on another material.
Layer produced by chemical vapor deposition.
Chemical vapor deposition may be a particularly well suited coating method.
It is used in chemical vapor deposition.
This is followed by deposition of an epitaxial GaAs layer by chemical vapor deposition.
Metalorganic chemical vapor deposition.
Chemical vapor deposition of aminated silanes on substrate surface to facilitate AuNR deposition.
Such a coating can be obtained by chemical vapor deposition or infiltration.
Thermal chemical vapor deposition is a common technique to grow aligned arrays of CNTs.
These fibers can be produced using chemical vapor deposition as described herein.
The chemical vapor deposition method is also used to form active layers.
The catalyst then may be applied by chemical vapor deposition or other means.
The chemical vapor deposition of boron nitride is similarly well under control.
Al interconnects are deposited by physical vapor deposition or chemical vapor deposition methods.
Plasma assisted chemical vapor deposition process involving amorphous carbon.
Samples were prepared with stationary atmospheric pressure chemical vapor deposition.
An improved reactor for chemical vapor deposition has just been described.
The polysilicon is desirably deposited by selective low pressure chemical vapor deposition.
The device is made by chemical vapor deposition in only two steps.
Chemical vapor deposition processes are well known in the art of coating glass substrates.
The fibers can be produced by chemical vapor deposition of boron on a tungsten filament.
Chemical vapor deposition is a method by which diamond can be grown from a hydrocarbon gas mixture.
The reaction chamber is a chamber of a plasma enhanced chemical vapor deposition reactor.
Plasma chemical vapor deposition may also be employed to generate porous inorganic detection materials.
Another common densification technique consists in performing chemical vapor deposition or infiltration.
Each of these chemical vapor deposition processes is carried out in a high temperature reaction chamber.
The coating is usually deposited by thermal chemical vapor deposition in a fluidized bed reactor.
Chemical vapor deposition and physical vapor deposition ( usually sputtering ) are applied.
The carbon nanotubes were grown by deposition via chemical vapor deposition in a tubular reactor.
In particular, chemical vapor deposition can be performed in a fluidized reactor.
Process and apparatus for liquid delivery into a chemical vapor deposition chamber.
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