Examples of 'chemical vapour deposition' in a sentence

Meaning of "chemical vapour deposition"

Refers to a technique used in material science and engineering to deposit thin solid films onto surfaces. It involves the reaction of a vaporized precursor chemical to form a solid material on a substrate. It is commonly used in manufacturing processes for semiconductors, coatings, and advanced materials

How to use "chemical vapour deposition" in a sentence

Basic
Advanced
chemical vapour deposition
Metal organic chemical vapour deposition reactors.
Step d advantageously takes place by chemical vapour deposition.
Chemical vapour deposition reaction chamber.
Plasma assisted chemical vapour deposition reactor.
Chemical vapour deposition furnaces.
Microwave plasma chemical vapour deposition apparatus.
Chemical vapour deposition of diamond.
Chemical modification with chemical vapour deposition technique.
Chemical vapour deposition furnaces designed or modified for the densification of carboncarbon composites.
A method to fabricate nanowires by chemical vapour deposition is given.
Chemical vapour deposition is a process by which diamond is grown from a hydrocarbon gas mixture.
Step b is advantageously carried out by chemical vapour deposition.
Modified chemical vapour deposition process.
Graphene can also be produced by chemical vapour deposition.
Plasma activated chemical vapour deposition method and apparatus therefor.

See also

Method for depositing a coating on a substrate by chemical vapour deposition.
Pulsating chemical vapour deposition.
This filling may be conventionally carried out by chemical vapour deposition.
Metalorganic chemical vapour deposition.
The deposition can be made by spin coating or chemical vapour deposition.
Hydrogen intervenes in the chemical vapour deposition of SiC by reducing successively the precursor.
The coating comprises a plurality of layers formed by chemical vapour deposition.
Organometallic chemical vapour deposition.
The deposition may be carried out by spin coating or chemical vapour deposition.
The methods are known as chemical vapour deposition and physical vapour deposition or sputtering.
Colourless gem cut from diamond grown by chemical vapour deposition.
Such a chemical vapour deposition method is well known to the man skilled in the art.
Glove box and metal organic chemical vapour deposition.
The employment of chemical vapour deposition to provide a metallic ceramic coating may also be possible.
Nevertheless industrial production is possible with the aid of chemical vapour deposition methods.
The coating is performed by chemical vapour deposition under higher temperature and controlled atmosphere.
The deposition of silicon carbide is carried out by the chemical vapour deposition technique.
Plasma assisted chemical vapour deposition is an equivalent term to PECVD.
Each reactant may be applied by any suitable method including chemical vapour deposition.
One form of pyrolysis process is chemical vapour deposition by hydrocarbons and gas.
The deposition of graphene layers has been demonstrated vía thermally assisted chemical vapour deposition.
The coatings were deposited by a known chemical vapour deposition process in the float bath section.
Single crystallites are then grown at the nucleation sites by means of chemical vapour deposition.
The chemical vapour deposition CVD technique which makes gaseous species react with a surface.
The reactor is advantageously used with a low pressure plasma enhanced chemical vapour deposition technique.
Metal organic chemical vapour deposition MRI.
Chemical vapour deposition CW.
AID is considered a subclass of chemical vapour deposition.
CVD chemical vapour deposition.
MOCVD metal organic chemical vapour deposition.
According to a particular example, the growth of the CNTs is performed by chemical vapour deposition.
MOCVD metal organic chemical vapour deposition MRI magnetic resonance imaging MTBF.
The pillars or nanotubes are preferably grown with a Chemical Vapour Deposition process.
Moreover, chemical vapour deposition offers good reproducibility from one wafer to the next.
Phase i is achieved by physical or chemical vapour deposition or by galvanoplasty ;.

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