Examples of 'epitaxial layer' in a sentence
Meaning of "epitaxial layer"
Epitaxial layer refers to a thin film or coating of material that is grown or deposited on a crystalline substrate in a way that the crystal structures of the layer and the substrate align or maintain a close relationship. This phrase is primarily used in fields such as semiconductor manufacturing or material science, where creating precise crystal structures is essential
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- In semiconductor fabrication: a single crystal layer formed on top of a single crystal substrate.
How to use "epitaxial layer" in a sentence
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epitaxial layer
The intrinsic epitaxial layer may be undoped.
Method for producing a gallium nitride epitaxial layer.
The epitaxial layer has a thickness tg.
Process for producing an epitaxial layer of gallium nitride.
Diffusion is for example obtained from an epitaxial layer.
Fracturing the epitaxial layer in the weakened zone.
There was no change on the epitaxial layer.
Doped epitaxial layer.
It thus includes a silicon wafer without or without an epitaxial layer.
The transistor is formed in an epitaxial layer of the second conductivity type.
The epitaxial layer then no longer has the desired resistivity.
Diffusion under epitaxial layer.
A thin layer of aluminum is generally present at the surface of this epitaxial layer.
The growth continues until a GaN epitaxial layer of sufficient thickness is produced.
A qualitative parameter of particular importance is the uniformity of thickness of the epitaxial layer deposited.
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A gate contact is then applied to the epitaxial layer at the bottom of the trench.
The epitaxial layer thicknesses were mapped over the whole wafer with a spectrophotometer.
The GaN growth step is continued until a continuous GaN epitaxial layer is produced.
Forming a second epitaxial layer on the structure ;.
The thin layer transfer process can therefore be repeated using the epitaxial layer.
The charge is generated inthe thin undepleted epitaxial layer underneath the readout electronics.
Forming a first layer of masking material of thermal silicon nitride superposing said epitaxial layer.
Growth of at least one epitaxial layer on a substrate ;.
Remaining lower than the critical thickness leads to a good quality of the SiGe epitaxial layer.
Growing at least one epitaxial layer on a substrate ;.
Parasite diffusions of the implanted dopant may also occur during formation of the epitaxial layer.
Forming a first epitaxial layer on the structure ;.
Periodic arrays of Al nanoparticles were fabricated onto a ZnO epitaxial layer.
The epitaxial layer 3 forms the base region.
The hot filament CVD technique is used to grow epitaxial layer.
Bonding the epitaxial layer onto a third support ; and.
CMOS integrated circuits are frequently formed on semiconductor substrates that have an epitaxial layer.
As noted earlier, a single epitaxial layer could suffice.
Hence, the epitaxial layer has a much higher resistivity than the wafer.
All of this is topped with an epitaxial layer 2.
The thickness of the epitaxial layer 40 can be selected to emphasize various electrical parameters.
Substrate 7 is a massive substrate or an epitaxial layer formed on a support.
In this example the epitaxial layer 3 covering the buried optical waveguide is also in InP.
Their depth is smaller than the thickness of epitaxial layer 2.
Typical dopants used in the epitaxial layer include boron, arsenic and phosphorus.
The epitaxy takes place by plastic deformation of the crystalline network of the epitaxial layer 3.
It is, for example, a bulk substrate or an epitaxial layer formed on a substrate.
This etching step eliminates the 2µm diameter diamond pillars connecting original diamond epitaxial layer.
Providing a semiconductor body having an epitaxial layer of opposite polarity deposited there on ;.
Conventional epitaxial processing steps and equipment can be employed to form the epitaxial layer 40.
An n-type aluminum gallium nitride epitaxial layer on said gallium nitride layer.
The epitaxial layer structure is listed in Table 1.
Accordingly, it is desirable if the first epitaxial layer is formed of semi-insulating silicon carbide.
Depositing a metal likely to form a Schottky barrier with the N-type epitaxial layer.
The epitaxial layer 40 forms a base region for an NPN transistor of the four layer device.
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Examples of using Epitaxial
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Equipment designed for epitaxial growth as follows
Epitaxial growth of stacked quantum dot structures
Cleavage of lateral epitaxial films for transfer
Examples of using Layer
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A layer is displayed independently from other layers
The usage of second layer additional purchase
Every layer seems to beat to a different tune
