Examples of 'etching method' in a sentence
Meaning of "etching method"
etching method - a technique used in art or printmaking to create designs on a surface
How to use "etching method" in a sentence
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etching method
An adequate etching method is reactive ion etching.
Or then by a chemical or plasma etching method.
The etching method may also be modified.
Waveguide obtained by selective etching method.
Plasma etching method and plasma etching apparatus.
The etching is then done by any dry etching method.
Thus the etching method of the invention is autolimiting.
Such elements are formed using a dry etching method.
Such an etching method is usually called dry anisotropic etching.
These two results depend on the chosen etching method.
A subsequent etching method will then form the grid finger structure.
The stack may for example be etched using a dry etching method.
Etching can be performed by a chemical etching method or by a reactive plasma method.
A minute protrusion / recess pattern is formed by using an etching method.
Said etching method may be used to etch the SiGe layer,.
See also
The extent of this retraction varies with the etching method used.
To create a notched profile, an etching method in two or three steps may be used.
In a variant embodiment, it is quite possible to consider using a conventional dry etching method.
A known lithographic etching method for forming such a window includes the following operations,.
It corresponds to a second stage in the reactive ion etching method of the invention.
Advantageously, the etching method is highly anisotropic so that the three-dimensional pattern presents vertical flanks.
However, the etching rate generally varies during the etching method.
It is understood that any known etching method may be used, for example laser etching.
The etching in second metallization level 9 is performed by any isotropic or anisotropic etching method.
Among physicochemical method, the electrochemical etching method is one of the most popular method.
According to another feature, the insulating material coating is etched by a reactive ionic etching method.
This etching method employs,.
In this embodiment, a manufacturing method using the dry etching method will be first described.
The etching method according to claim 1, wherein the layer of chalcogenide comprises GeS 2.
These patterns are produced, for example, by a chemical etching method.
Conventionally, the polishing or plasma etching method is stopped when the covering material 130 is reached.
The technique disclosed by document [ 1 ] can not use the collective photolithography and etching method.
The etching method used is etching by carbon tetrafluoride ( CF 4 ) plasma.
The etching of the thermometric material 116 is generally carried out with a plasma-assisted chemical etching method.
FIG . 2 illustrates the selective etching method of the invention ;.
A dry or PEC etching method is used to roughen the surface of the n-type layer 42.
Figure 6, Panels A-E show an exemplary possible etching method to construct flowcells herein.
An ion beam etching method enabling to produce an etched surface ( 2 ) on a semiconductor ( 1 ) or insulant.
The first guiding layer 20 is then locally etched ( FIG . 2B ) using a conventional dry etching method.
A preferable dry etching method is ICP ( inductively coupled plasma ) etching.
It is Samsung 's first processor to use the 7 nm EUV ( Extreme Ultra-Violet ) etching method.
FIG . 2 is a flow chart of an etching method employing the device in FIG . 1 ;.
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Etching of plastic substrates prior to their metalization
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Etching of plastic substrates prior to their metallization
