Examples of 'etching solution' in a sentence
Meaning of "etching solution"
etching solution: A chemical liquid or substance used in the process of etching, which involves engraving or creating designs on a surface such as metal, glass, or stone
How to use "etching solution" in a sentence
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etching solution
The etching solution exhibits considerable exothermicity.
Restoration of the quality of the etching solution.
An etching solution is prepared using the amounts below.
It is preferred to dilute the etching solution.
The etching solution was circulated in the anolyte chamber.
Filtering of the regenerated etching solution.
The etching solution is based on a stabilized acidic permanganate solution.
Package soft etching solution.
A i treating the plastic surface with an alkaline etching solution.
The chemical etching solution is chosen depending on the material to be etched.
These elements should then be added to the etching solution.
Acids which are used in the etching solution are preferably inorganic acids.
Air is excluded to prevent the aging of the etching solution.
Such an etching solution will be familiar to those skilled in the art.
It is made of a suitable material to withstand at best the chemical etching solution.
See also
It is uses as an etching solution and is usually used to clean the teeth.
Wet etching is performed by means of at least one aqueous etching solution.
Etching solution or.
Etching is then performed by immersing this assembly in the bath of etching solution.
An etching solution for etching the metal layer is known to the art.
According to the invention a silicon containing compound is added to the etching solution.
The acidic etching solution comprises silver nitrate and nitric acid.
This etching is advantageously performed by wet process etching using an acid etching solution.
The etching solution concentration and temperature are suitably determined in practical ranges.
The proportions of the four initial components of the etching solution have been studied.
The etching solution is obtained by using a buffered ferricyanide solution containing potassium diorthophosphate.
The dilution factor is calculated relative to the total volume of etching solution before dilution.
The low exothermicity of the etching solution during its preparation permits almost simultaneous use.
This is accomplished according to the invention by using a phosphoric acid etching solution containing silicon.
The alkaline etching solution comprises,.
Furthermore, it is the object of the present invention to provide a corresponding etching solution.
A description will be made of the etching solution in which the porous Si is etched.
As a result, manganese dioxide is formed which separates into the etching solution.
Each metal has a specific etching solution as follows,.
In addition, if desired, a wetting agent may also be added to the acidic etching solution.
Furthermore, the etching solution can advantageously contain a soluble fluoride.
The etching rate has dependencies on the concentration of the etching solution and the temperature.
Advantageously, the etching solution according to the invention contains hydrochloric acid.
The silicon wafers remain in the etching solution for 3 minutes.
Moreover, manganese dioxide forms a precipitate that is difficult to remove from the etching solution.
The concentration of nitric acid in the etching solution 6 is several tens of percent.
This layer serves to define zones where the layer 2 is attacked by the etching solution.
Another cupric chloride etching solution is basic aqueous ammonium hydroxide / cupric chloride.
A method according to claim 2, characterized in that the used etching solution contains ferric chloride.
A neutral or near neutral pH etching solution for effectively etching molybdenum and tungsten comprising,.
These contaminants may include oxides of silicon, silicon-germanium and / or residual components of the etching solution.
Next, the polymer tracks are dissolved with an etching solution to form cylindrical pores.
An etching solution is prepared according to Example 2.
After one week operation, the inventive acidic etching solution again was pumped out.
In general, the etching solution comprises an acid, a base, or a neutral solution.
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Etching of plastic substrates prior to their metalization
I will buy an etching for your father
Etching of plastic substrates prior to their metallization
