Examples of 'etching step' in a sentence
Meaning of "etching step"
Etching step refers to a specific stage or process involved in the art of etching, which is a technique used to create designs or images on a metal plate. It involves the use of chemicals to create lines or textures on the plate, which are then used to produce prints
How to use "etching step" in a sentence
Basic
Advanced
etching step
An etching step can then be possibly provided.
This enables a chemical etching step to be subsequently performed.
No etching step was performed prior to the analyses.
The purpose of the etching step is two fold.
An etching step of the prestressed layer.
The actual dielectric etching step is then performed.
The etching step also comprises lithographic masking.
This dimension is reduced in the plasma etching step.
This etching step may be a dry etching step.
These methods also comprise a subsequent etching step.
The actual metal etching step is then performed.
The ion machining step is a mechanical etching step.
The etching step may be a dry or a wet etching step.
The next step is an etching step.
An etching step is advantageously performed in order to thin the metallic material.
See also
This deposit is made before the etching step.
At least one second etching step to expose said undercut layer.
The waveguide structure can be produced in a single etching step.
The etching step can be performed by wet or gaseous method or by laser.
Patterning is for example performed by a photolithography step followed by an etching step.
After the etching step the first layers of glass are deposited.
The method according to the invention does not impose an etching step.
The baths are used in the etching step of composite semiconductor device manufacturing.
Patterning is achieved by a planarization step associated or not with an etching step.
This method comprises an anisotropic etching step followed by an isotropic etching step.
That contamination layer should be removed during the etching step.
Pore sizes are established in a subsequent etching step using a strong alkali solution.
Method of manufacturing semiconductor devices including at least a reactive ion etching step.
This etching step may be omitted if the remaining separation layer is sufficiently thin.
The catalyst layer is used as an etching mask for the etching step.
A similar mechanical etching step may be conducted subsequent to step b and in advance of step c.
It is therefore unnecessary to carry out a selective etching step along the stress fields.
The acid etching step may include a mixture of sulfuric and hydrochloric acids.
The photosensitive layer protects the underlying substrate during the etching step.
This step and the second insulating layer etching step may be performed simultaneously.
The photosensitive layer protects any metal thereunder during the etching step.
The duration of this chemical etching step determines the dimensions of the hollow portions.
The second resist protects the underlying metal layer during the etching step.
This etching step removes metal not covered by photoresist through the action of a gaseous plasma.
Then Ar gas is inserted for a sputter etching step.
The etching step may include RIE oxygen plasma etching masked by a photoresist mask.
These sacrificial layers are typically eliminated by an HF vapour etching step.
The second selective etching step preferably affects the layers C k and leaves the other layers intact.
Then Ar gas is inserted into the chamber for a sputter etching step.
An etching step consisting of the formation of solid salts,.
Particularly advantageously, the etching step comprises plasma etching.
An etching step of the prestressed layer, perpendicular to its surface.
Preferably the top portion etching step is a dry-etching step.
An etching step for defining trenches within said substrate ;.
Optional pretreatments include a shot blasting and / or acid etching step.
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Etching of plastic substrates prior to their metalization
I will buy an etching for your father
Etching of plastic substrates prior to their metallization
