Examples of 'first dielectric layer' in a sentence
Meaning of "first dielectric layer"
first dielectric layer: This phrase relates to a specific component in electronics or technology, indicating the initial layer of material with insulating properties
How to use "first dielectric layer" in a sentence
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first dielectric layer
Portions of the first dielectric layer are removed to for.
In this embodiment the second dielectric layer is thinner than the first dielectric layer.
The first dielectric layer is preferably deposited directly on the substrate.
The apparatus of the invention comprises a first dielectric layer having a first electrode embedded therein.
The second dielectric layer may be made from a different dielectric to the first dielectric layer.
First porous layer and a first dielectric layer covering the first layer.
A first conductive vÃa connects the first and second conductive elements through the first dielectric layer.
A part of this first dielectric layer may also cover the first RF transmission electronic circuit.
The second dielectric layer may have a higher relative permittivity than the first dielectric layer.
A first dielectric layer comprising silicon nitride ;.
An IR reflecting layer is disposed over the first dielectric layer.
Disposing a first dielectric layer on the substrate ;.
It may in particular have a thickness greater than that of the first dielectric layer ( a ).
Depositing a first dielectric layer so as to be supported by the substrate ;.
Chemical mechanical polishing of the second dielectric layer, with a stop on the first dielectric layer.
See also
A first dielectric layer supported by the glass substrate;.
The windscreen of Claim 7, wherein the first dielectric layer comprises a metal oxide.
A first dielectric layer is disposed, directly or indirectly, on the glass substrate.
Planarizing the device as far as the upper level of the first dielectric layer D1 ;.
Forming the first dielectric layer on the detection element ;.
An interference filter according to Claim 1 in which the first dielectric layer comprises a metal oxide.
Depositing a first dielectric layer on the upper surface of the underlying layer ;.
In the openings, this compound ZV comes into contact with the first dielectric layer D1.
The first dielectric layer and the first screen layer are transparent ;.
The Bragg mirror of claim 1 wherein the first dielectric layer includes silicon dioxide.
First dielectric layer 3 functions as an antireflection layer in certain embodiments of this invention.
The glass substrate and the ITO electrodes are then covered with a first dielectric layer D1.
First dielectric layer 14 is deposited over the entire upper surface of the structure.
A first infrared reflective layer over the first dielectric layer ( ii ) ;.
A first dielectric layer disposed on a second portion of the top surface of the substrate ;.
At least one infrared reflective layer over the first dielectric layer ( ii ) ;.
Depositing a first dielectric layer having openings defining the source and drain contacts ;.
The substantially triangular exposed areas 75 ′ of the first dielectric layer 75 form eight notch radiating elements.
The first dielectric layer 18 is deposited on the rear electrode by known thick film techniques.
A first heat and / or radiation reflective metallic layer 46 can be deposited over the first dielectric layer 40.
A first dielectric layer comprising one or more metal oxide or metal alloy oxide layers ;.
An electrical charge storage layer 10 is then deposited by CVD on the first dielectric layer 12.
The material constituting the first dielectric layer is selected from a polypropylene and a polyethylene terephtalate ;.
A second dielectric layer DIELI2, preferably made of the same materialas the first dielectric layer DIELI1.
The first dielectric layer 28 can also include a second film formed over the first film.
A subcritical metallic layer 58 is located over the first dielectric layer 40.
A first dielectric layer sputter deposited over the substrate ( i ) ;.
More preferably, the dielectric constant of the first dielectric layer material is 1000 or greater.
The first dielectric layer 40 can be transparent to visible light.
A first heat and / or radiation reflective film or layer 46 is deposited over the first dielectric layer 40.
The first dielectric layer had a thickness of about 50 microns.
First metallisation level forming a first array of conducting lines 108 arranged on the first dielectric layer 106 ;.
The thickness of the first dielectric layer was correspondingly reduced to 25 to 30 microns.
A first dielectric layer is disposed, directly or indirectly, on the first silicon-based layer.
The thickness of the first dielectric layer may be less than or equal to 75 nm.
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