Examples of 'second dielectric layer' in a sentence
Meaning of "second dielectric layer"
second dielectric layer - In the context of materials or electronics, this phrase likely refers to the second layer of a material that does not conduct electricity
How to use "second dielectric layer" in a sentence
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second dielectric layer
The second dielectric layer comprises silicon nitride.
Forming the superstrate on the second dielectric layer.
A second dielectric layer is deposited on the magnetooptical recording layer.
The superstrate is formed on the second dielectric layer.
A second dielectric layer having.
Putting in the superstrate in place on the second dielectric layer.
A second dielectric layer having a relatively lower density is formed on the first layer.
This superstrate is put in place on the second dielectric layer.
In this embodiment the second dielectric layer is thinner than the first dielectric layer.
Then vias may be opened in the second dielectric layer.
The second dielectric layer may be made from a different dielectric to the first dielectric layer.
The material constituting the second dielectric layer is a polymer ;.
The second dielectric layer preferably comprises silicon nitride formed by reactively sputtering a cylindrical magnetron.
In some embodiments, the substrate comprises a second dielectric layer disposed on a semiconductor substrate.
The second dielectric layer may have a higher relative permittivity than the first dielectric layer.
See also
Chemical-mechanical polishing the second dielectric layer stopping on the first dielectric layer ;.
A second dielectric layer is disposed over the IR reflecting layer.
The device of claim 1 wherein the substrate comprises a second dielectric layer disposed on a semiconductor substrate.
A second dielectric layer comprising silicon nitride ;.
The first surface mirror of claim 1, wherein the second dielectric layer comprises titanium oxide.
Depositing a second dielectric layer on the first conductive layer ;.
Conveniently, the heater element comprises a sprayed metal track deposited on the second dielectric layer.
Forming the second dielectric layer on a second substrate ;.
A second infrared reflective layer over the second dielectric layer ( v ) ;.
Depositing a second dielectric layer on the electrical charge storage layer ;.
Thermal and electrostatic screen 128 arranged in the second dielectric layer.
Deposition of a second dielectric layer on the electric charge storage layer ;.
The etch should be selective to the material of the second dielectric layer 18.
Depositing a second dielectric layer on the first dielectric layer, and.
Display film according to claim 11, wherein the material constituting the second dielectric layer is a polymer.
Putting the second dielectric layer in place on the first dielectric layer ;.
The coated article of claim 13, wherein the second dielectric layer comprises silicon nitride.
The second dielectric layer may be a uniform layer of at least about 20 nm in thickness.
The rear-electrode 5 is covered by a second dielectric layer 6.
Forming the second dielectric layer on the first dielectric layer ; and.
The coated article of claim 4, wherein the second dielectric layer ( v ) comprising,.
Second dielectric layer covering at least the first plane electrically conducting portion ;.
The coated article of claims 5 and 7, wherein the second dielectric layer ( v ) comprising,.
The second dielectric layer transfers compressive strains to the second layer of semi-conductor material.
A second heat and / or radiation reflective layer 58 is deposited over the second dielectric layer 50.
This second dielectric layer is itself covered with a second protective layer 7 similar to the first 5.
In the illustrated film stack, a second metal layer 40 is applied over the second dielectric layer 38.
A second dielectric layer 48 covers the patterned electrodes and protects and electrically insulates the cell.
A second heat and / or radiation reflective layer 58 can be deposited over the second dielectric layer 50.
This second dielectric layer L3 is metallised on both faces.
Second metallisation level forming a second array of conducting lines 112 arranged on the second dielectric layer 110 ;.
The orifices in the second dielectric layer D2 are superposed over the transparent ITO electrodes.
Second dielectric layer 52 and third masking layer 54 are formed.
In one example, the second dielectric layer is at least 80 nm thick.
The second dielectric layer D2 is covered with a photosensitive resin layer R.
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