Examples of 'implantation step' in a sentence
Meaning of "implantation step"
implantation step: This phrase is often used in medical or scientific contexts to describe a stage in a process where something is implanted or inserted into another object or organism
How to use "implantation step" in a sentence
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implantation step
An implantation step as in d of the first embodiment is then performed.
The implantation depth is less than in the previous implantation step.
Embryo implantation step by step.
This doping may also be done after epitaxy by a standard implantation step.
Single ion implantation step serves to obtain the buckling.
The pattern may be covered with a mask during the implantation step.
The additional implantation step may be carried out with helium gas ions.
The gate acts as implantation mask during a source and drain implantation step.
The following implantation step is then performed,.
It therefore becomes easy to form areas with different concentrations with the same implantation step.
First embodiment of the invention carries out the implantation step at a relatively high temperature.
The implantation step is performed after formation of gate electrode 5.
Moreover the presence of the electrode during the implantation step protects the structure.
Such an implantation step can be used to make asymmetric double-gates.
At this point, the surgical device is ready for the implantation step.
See also
Second ion implantation step through a mask to define over-doped regions.
The method of claim 2, wherein the step of defect creation includes an implantation step.
The implantation step is then followed by a step for thickening the conductive electrode 20.
The method of claim 5 in which said implantation step is performed through a window mask.
The implantation step may also be followed by a step for thickening the conductive electrode 20.
For this, a method consists in reducing the implantation energy at each new implantation step.
Alternatively, the implantation step may also be carried out entirely after the encoding step.
The substrate 30 is then submitted to the gaseous compound implantation step through surface 35.
First ion implantation step for doping the front face of the substrate in its entirety ;.
FIG . 2 illustrates this first ion implantation step.
In effect, the implantation step encourages closer contact between the electrode and the structure.
FIG . 3 illustrates the same substrate during a second ion implantation step.
FIG . 5C illustrates an implantation step performed according to the present invention.
The amorphization may be carried out by means of at least one implantation step ( FIG . 3B ).
In this way, when the implantation step is performed, the following takes place,.
The implantation step leads inherently to the recessed mesa 40 shown in FIG . 6c.
FIG . 1 illustrates the ion implantation step of a wafer 1 of semiconductor material.
The ionic implantation step is shown by arrows in FIG . 2.
The ionic implantation step 120 allows formation of gate areas of the JFET transistor.
FIG . 6A shows an ionic implantation step performed through a face of a silicon wafer 20.
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