Examples of 'phase deposition' in a sentence
Meaning of "phase deposition"
phase deposition: This phrase is used in scientific contexts, particularly in materials science and physics, to describe the process of depositing a thin film or layer of material onto a surface. It is often part of the manufacturing or research processes for various technologies.
How to use "phase deposition" in a sentence
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phase deposition
Various vapor phase deposition methods are known.
The deposit is usually made using a vapour phase deposition technique.
Sputtering and vapor phase deposition are mentioned in this document.
Firstly the insulants were deposited by conventional chemical vapour phase deposition processes.
The gas phase deposition of liquid dielectric films may notably be cited.
The layers obtained by vapor phase deposition are free of porosity.
The latter can be deposited by low pressure chemical vapor phase deposition.
This deposit is done by vapour phase deposition at low temperature and low pressure.
This deposition can be carried out by a chemical vapour phase deposition process.
But such a liquid phase deposition is difficult to control and the deposition thickness is high.
This layer can be deposited by vapour phase deposition or electrolytically.
They are advantageously coated internally with polyurethane or carbon deposited by vapor phase deposition.
Method of manufacturing a semiconductor device by vapor phase deposition using multiple inlet flow control.
Sag phase deposition begins in the upper Eocene to Oligocene.
The nanotube impregnated gas is now ready for gas phase deposition.
See also
For example, a vapor phase deposition is used.
The deposit can be made with a spin coater or by chemical vapour phase deposition.
Example 8 illustrates using liquid phase deposition to deposit the electroactive molecular species.
The institute says it will particularly focus on slot casting and gas phase deposition methods.
Second, the liquid phase deposition requires a dissolution step and a solvent removal step.
The techniques used for doping of materials include vapor phase deposition and ion implantation.
Vapor phase deposition techniques generally require varying degrees of vacuum, i.e., low pressure.
The depositing technique used may be, vapor phase deposition.
However, low pressure chemical vapour phase deposition gives better deposits from the uniformity standpoint.
Epitaxial transistor - a bipolar junction transistor made using vapor phase deposition.
The vapour phase deposition process can be a chemical ( CVD ) process or a physical ( PVD ) process.
Generally, all the techniques of physical vapor phase deposition in can be used.
Alternatively, the electro-active layer may equally be produced by liquid phase deposition.
This deposit can be produced by a plasma-assisted, chemical vapor phase deposition process.
Katz reports the NDI based OFETs, constructed by vapor phase deposition.
Depositing of a metal layer M 3 in the cavity, more preferably by flash vapor phase deposition.
LPCVD oxide means one oxide formed by sub-atmospheric chemical vapor phase deposition.
Advantageously, the depositing of the metal layer M 3 is carried out by flash vapor phase deposition.
Layer 138 can be deposited by low pressure chemical vapor phase deposition.
The method according to claim 41, the oxide being deposited by plasma vapor phase deposition.
The resistivity-change material is formed, for example, by chemical or physical vapor phase deposition.
This filling operation is performed by chemical vapor phase deposition ( CVD ).
Preferably, coating 47 is obtained by a vapour phase deposition.
This deposition of layer 148 takes place by chemical vapor, phase deposition.
FIGS . 10A and 10B demonstrate formation of discontinuous layers by organic vapor phase deposition.
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