Examples of 'photoresist layer' in a sentence
Meaning of "photoresist layer"
photoresist layer - A light-sensitive material used in photolithography to form a patterned coating on a surface
How to use "photoresist layer" in a sentence
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photoresist layer
This is done by applying a photoresist layer to the assembly.
The photoresist layer is then developed in alkaline aqueous solution.
The grating is formed in a photoresist layer.
Removal of photoresist layer is normally a wet process.
The layer to be etched is coated with a masking photoresist layer.
Heating the photoresist layer in order to evaporate the solvent.
The plasma etch step concurrently removes the photoresist layer.
A photoresist layer can then be coated on the metal or other layer.
The desired membrane pattern is thereby established in the photoresist layer.
SEM image of a photoresist layer used in semiconductor manufacturing taken on a field emission SEM.
Over the conductive metal is applied a thin film of a photosensitive actinic photoresist layer.
The light areas depict regions where the photoresist layer was exposed to the light.
Such coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer.
The end result is a semiconductor wafer coated with a photoresist layer exhibiting a desired pattern.
Next, a photoresist layer is applied to the assembly.
See also
It may also depend upon the manner in which the photoresist layer is heated.
More particularly, the photoresist layer is deposited by spin coating.
Patterning the parylene layers in an RIE oxygen plasma using a thick photoresist layer as a mask.
Depositing a second photoresist layer on the oxide mask ;.
A photoresist layer is coated thereon from a non-aqueous solvent.
Removal of such metal transfers the pattern from the photoresist layer to the metal layer.
If necessary, the photoresist layer is heated in order to evaporate the solvent ;.
Removal of such dielectric transfers the pattern from the photoresist layer to the dielectric layer.
Spreading a photoresist layer over a flat substrate made of bulk metal ;.
Patterning is more particularly performed by means of a photoresist layer deposited on the protective layer 9.
Photoresist layer is spread over a flat substrate made of bulk metal ;.
As a protective coating, a photoresist layer may be used for example.
The photoresist layer was exposed using a mask aligner, and developed to form a predetermined pattern.
In a second preferred aspect, a first photoresist layer is deposited on top of a first elastomeric layer.
Covering the whole device by means of a dielectric layer MK1 followed by a photoresist layer MK2.
Step of coating a photoresist layer onto the planar surface of said substrate ;.
The conductive layer 11 is covered with an initial photoresist layer over a desired height.
Applying a photoresist layer that is to serve as a spacer for the capacitive read-out.
The layer of nickel was built in the places where the photoresist layer 5 was removed.
In contrast, a primary imaging photoresist layer is usually applied to a substantially flat surface.
The walls of cavity 1 are covered by a photoresist layer 5.
In other embodiments, the photoresist layer may be removed with an oxygen plasma.
Photoresist layer 39 is applied completely over the entire surface of microprojection array sheet 35.
This is because as the lines become thinner, the photoresist layer must be thinner.
Deposition of a photoresist layer and illumination with ultraviolet radiation through a mask defining the gate electrode ;.
Realisation of an opening BO in a photoresist layer 8 by photolithography.
The photoresist layer is heated, if necessary to evaporate the solvent ;.
The polyether amide film had a thickness of 2.5 µm after removal of the photoresist layer.
Waste photoresist layer 5 was removed from the shim 4 by lye.
In step 406 an etch mask is produced in a photoresist layer.
Remaining photoresist layer 5 thus constitutes shield 9 made of electro-insulation material.
Depicted are substrate 1, oxide layer 3 and photoresist layer 5.
The photoresist layer thus applied may have a thickness of 5 microns to 50 microns.
The solvent is allowed to dry, leaving the photoresist layer 14.
A photoresist layer 202 is deposited on the dielectric, and lithographically exposed and developed.
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Every layer seems to beat to a different tune
