Examples of 'photoresist material' in a sentence
Meaning of "photoresist material"
photoresist material - This refers to a light-sensitive substance used in processes like photolithography to transfer images to a substrate
How to use "photoresist material" in a sentence
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photoresist material
The photoresist materials contains photoresist material in propylene carbonate.
Photoacid generators are for example widely used in conventional photoresist material.
Preferably the photoresist material is deposited by spinning and hardened by baking.
Spacer element D is made of photoresist material.
The baked photoresist material is then removed by either conventional chemical or mechanical techniques.
According to some embodiments, the photoresist material is a negative photoresist.
The device of claim 1 wherein the gratings are formed of a photoresist material.
The remaining third layer photoresist material is then stripped from the aluminium layer.
In the embodiment shown, the grating is formed by the photoresist material itself.
Alternatively, the photoresist material may be a discontinuous coating or deposit.
The first material may be, for example, a positive or negative photoresist material.
A semiconductor wafer 12 covered with a photoresist material is placed in the image plane.
The apparatus according to claim 2, wherein said cover member comprises a photoresist material.
The photoresist material may also need to be heated slightly before becoming light-sensitive.
In at least one embodiment a tubular member, or a portion thereof, is provided with a photoresist material.
See also
The thickness of the photoresist material 36 determines the length of the resulting microneedle array.
The system according to any of the preceding claims, wherein the photoresist material is crosslinked.
The reacted photoresist material 42 may undergo significant changes as exemplified in the diagram immediately below.
In particular, closing element 10 is made of a single photoresist material.
The coating of photoresist material may be applied in numerous ways, including high-velocity spin coating.
By the method of centrifugal separation a steel plate is coated with photoresist material 1-2 micromicron deep.
A conventional photoresist material is spin coated onto the inner surface 301 of stent blank 300.
FIG . 5A shows coating a silicon wafer with a positive photoresist material.
In a more preferred embodiment, the photoresist material 42 is a photo cross-linkable material.
The system according to claim 8, wherein the partition ( 12 ) comprises, in particular consists of, a photoresist material.
FIG . 5E shows striping the photoresist material and evaporating gold.
In particular, partition 12 is made of a photoresist material.
FIG . 5C shows developing the photoresist material.
A method as in claim 3, further comprising forming the islands ( 32 ) from a photoresist material using a photolithography process.
Fig . 9 shows a similar chamber level sacrificial structure formed from a negative photoresist material magnified at 1,000 times.
The apparatus according to claim 12, wherein said photoresist material is SU-8.
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