Examples of 'second dielectric' in a sentence
Meaning of "second dielectric"
a material used to separate or insulate two conductive components in an electronic circuit, providing electrical insulation
How to use "second dielectric" in a sentence
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second dielectric
The second dielectric layer comprises silicon nitride.
Forming the superstrate on the second dielectric layer.
A second dielectric material is deposited to form a second gate insulator.
Selective etching of the second dielectric.
A second dielectric layer is deposited on the magnetooptical recording layer.
The superstrate is formed on the second dielectric layer.
A second dielectric layer having.
Putting in the superstrate in place on the second dielectric layer.
A second dielectric film can be formed over the first film.
This superstrate is put in place on the second dielectric layer.
A second dielectric plate and a second ground plate are further provided.
Then vias may be opened in the second dielectric layer.
A second dielectric layer having a relatively lower density is formed on the first layer.
A high optical thickness of the second dielectric coating is a fundamental condition.
A second electrode is sandwiched between the first dielectric and the second dielectric.
See also
The process further includes depositing a second dielectric zone on the integrated circuit.
The second dielectric virial coefficient is evaluated for several sets of shape parameters and temperature.
This process is more easily controlled if the second dielectric is deposited conformally.
With at least one second dielectric material layer formed on said charge storage layer.
The first dielectric material may be the same as the second dielectric material.
In this embodiment the second dielectric layer is thinner than the first dielectric layer.
This further improves the strength of the lamination between the first and second dielectric layers.
The first and second dielectric layers are between the nozzle plate and the substrate.
According to an embodiment, the second dielectric material is air.
The second dielectric layer may be made from a different dielectric to the first dielectric layer.
The material constituting the second dielectric layer is a polymer ;.
The second dielectric layer preferably comprises silicon nitride formed by reactively sputtering a cylindrical magnetron.
Deposition of a second dielectric material ;.
The second dielectric substrate has a microstrip transmission line on the other side for a feed structure.
Covering the first active layer with a second dielectric layer ;.
The second dielectric layer may have a higher relative permittivity than the first dielectric layer.
A second metal silver layer over the second dielectric layer ;.
A second dielectric layer is disposed over the IR reflecting layer.
Then, an isotropic etching of the second dielectric material may be carried out.
A second dielectric layer comprising silicon nitride ;.
An organic transistor as claimed in claim 1, wherein the second dielectric material is alumina.
The second dielectric may be for example SiO 2.
The second screen layer is permanently fixed to the second dielectric layer ;.
Forming the second dielectric layer on a second substrate ;.
First upper shielding positioned on the upper face of the second dielectric element ;.
Second dielectric material and a buffer layer 6 are deposited.
Realisation of the upper conductor in the second dielectric using a damascene-type technique ;.
A second dielectric vía fill formed in a second insulating layer ;.
In some embodiments, the substrate comprises a second dielectric layer disposed on a semiconductor substrate.
A second dielectric vía fill formed in a vía in a second insulating layer ;.
Chemical-mechanical polishing the second dielectric layer stopping on the first dielectric layer ;.
Second dielectric element located above the first dielectric element ;.
A second heat and / or radiation reflective metal layer over the second dielectric layer ;.
Depositing a second dielectric layer on the first conductive layer ;.
The first surface mirror of claim 1, wherein the second dielectric layer comprises titanium oxide.
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