Examples of 'silicon nitride layer' in a sentence
Meaning of "silicon nitride layer"
silicon nitride layer: This phrase refers to a coating or thin film made of silicon nitride. It is used in various industrial applications, such as protective layers in electronics or as a component in materials with high thermal resistance and mechanical strength
How to use "silicon nitride layer" in a sentence
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silicon nitride layer
It may be a silicon nitride layer doped with phosphorus atoms.
Said porous dielectric layer can be a silicon nitride layer.
The silicon nitride layer is subjected to a weak mechanical stress.
The grid electrode is disposed directly on the silicon nitride layer.
The silicon nitride layer can additionally be doped with aluminum.
These spacers are formed by depositing a thin silicon nitride layer followed by a polysilicon layer.
This silicon nitride layer may be the last layer of the coating stack.
Hydrogen may be incorporated into the silicon nitride layer by the PECVD precursors.
The silicon nitride layer may be formed using PECVD.
External portion 6 results from the deposition of a silicon nitride layer.
The deposition of a silicon nitride layer and of a polysilicon layer is then performed.
In the case of a glass substrate, for example, this may be a silicon nitride layer.
The silicon nitride layer has a thickness of approximately 2 nm.
The silicon dioxide layer 4 serves as a support layer for silicon nitride layer 6.
Next, the silicon nitride layer is conventionally removed.
See also
The p-doped silicon substrate is thus covered with an n-doped silicon nitride layer.
The silicon nitride layer 6 is then etched to give windows d.
The functional layer may especially be a nitride layer, for example a silicon nitride layer.
Since there is no longer a silicon nitride layer 2, there is no point in etching it.
The method as claimed in claim 1, wherein the second mask includes a silicon nitride layer.
In which the silicon nitride layer acts substantially as mechanical protection against damage ( scratches ).
The semiconductor substrate is provided with a hydrophilic SiO2 - and preferably a silicon nitride layer.
Depositing a silicon nitride layer having a thickness substantially equal to that of the contact layer ;.
In step B there is formed on the first silicon oxide layer 2 a silicon nitride layer 3.
A further silicon nitride layer 56 is then laid down on the resulting uninterrupted flat surface.
The front face 50 may be passivated by a silicon oxide or silicon nitride layer.
The second mask can include a silicon nitride layer formed on said semi-conducting thin layer.
Silicon nitride layer 40 may be of or include Si3N4 in certain embodiments of this invention.
The walls of the emitter-base opening are coated with a silicon nitride layer 44.
This silicon nitride layer may be Si-rich in certain embodiments.
Silicon doped with about 5 % Al from which a silicon nitride layer was formed.
A silicon nitride layer 18 is then conformally deposited.
Thus, it is sometimes desirable not to make the silicon nitride layer 5 too Si-rich.
Then, overcoat silicon nitride layer 25 is deposited on the substrate 1 over the underlying layers.
A layer of photoresist, not shown is deposited over the bottom silicon nitride layer 250B.
For this purpose, a silicon nitride layer 7 is conformally deposited.
Silicon nitride layer 25 is the outermost layer of the coating 2.
The lower ( or undercoat ) silicon nitride layer provides anti-reflection and / or color modification functions.
The silicon nitride layer 106 may be deposited using a CVD process.
Then, the portions of the silicon nitride layer unprotected by spacers 121 are removed.
The silicon nitride layer is then deposited by a plasma of silane and nitrogen ( SiH4 +N2 ).
To accomplish this, a silicon nitride layer is formed, having a thickness of 50 nm, for example.
First, a silicon nitride layer is deposited as in figure 8B.
At this level a silicon nitride layer 40 and openings 41 in the periphery are also shown.
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