Examples of 'sputtering targets' in a sentence
Meaning of "sputtering targets"
sputtering targets: In the context of materials science or technology, sputtering targets are used in the physical vapor deposition process to deposit thin films onto a substrate. These targets are bombarded with energetic particles to eject atoms or molecules that form the coating material
How to use "sputtering targets" in a sentence
Basic
Advanced
sputtering targets
It has also been difficult to fabricate lithium sputtering targets heretofore.
Sputtering targets based on an electrically conductive zirconium oxide are not described.
Further aspects of the present invention provide methods of making sputtering targets.
These sputtering targets may be disposed on an inner surface of the conductive wall.
The plasma chamber may further comprise one or several sputtering targets.
Refractory metal sputtering targets exemplify a broader need for microstructural uniformity in refractory metal plates.
Learn more about monotlic rotary targets and CuGa sputtering targets for CIGS.
With innovative sputtering targets CIGS producers can significantly reduce their production costs.
Other applications include ultrasonic welding, wave soldering, and sputtering targets.
Also, the density of the sputtering targets is particularly good.
The sputtering targets 24e are made from the material to be deposited on the substrate.
Additionally, new, incremental refining capacity for spent ruthenium sputtering targets came online earlier this year.
We supply sputtering targets to the solar industry for use in the following technologies,.
They are sometimes used as sputtering targets for physical vapor deposition ( PVD ).
Example 3, Use of sputtering targets from example 2 to produce films on a substrate.
See also
Home > Products > Sputtering targets for coating.
Our range includes MoNa sputtering targets with a sodium content of 5 % and 10 %.
Linder MF, a pair of tubular sputtering targets was operated at 16 kW / m.
Under MF, a pair of tubular sputtering targets was operated at 16 kW / m.
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Sputtering technique forms versatile quasicrystalline coatings
It can also cause sputtering upon acceleration
