Examples of 'cathode sputtering' in a sentence
Meaning of "cathode sputtering"
cathode sputtering: A process in which material is dislodged from a cathode target and deposited onto a substrate, often used in thin film deposition techniques in manufacturing and electronics industries
How to use "cathode sputtering" in a sentence
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cathode sputtering
It is preferably deposited by thermal evaporation or by cathode sputtering.
Cathode sputtering enables to deposit a thin layer of material on a substrate.
Its preferred mode of deposition is cathode sputtering.
It was put into the cathode sputtering installation of the laboratory.
These deposits may be made by cathode sputtering.
The cathode sputtering technique is generally carried out in a reactor or an enclosure.
The successive layers are deposited by cathode sputtering.
Deposition by cathode sputtering of a thin metallic layer on said chalcogenide layer.
A physical vapor deposition process by cathode sputtering was used.
The cathode sputtering can consist of the simultaneous cathode sputtering of both targets.
The layers were formed by cathode sputtering.
For example, a cathode sputtering or an evaporation could be used.
The mixing in vapour phase may be obtained by cathode sputtering.
This coating is deposited by cathode sputtering on mineral glass substrates.
All the layers were deposited by magnetically enhanced cathode sputtering.
See also
These processes include both cathode sputtering processes and arc discharge processes.
The invention relates to a target component for cathode sputtering.
Magnetron cathode sputtering is a high energy deposition process for sputtered compounds ( a few eV ).
This tie layer is easily deposited by magnetron cathode sputtering.
Preferably, cathode sputtering is used to provide a continuous layer of small thickness, free of defects.
Each layer of the stack can be deposited by cathode sputtering.
Cathode sputtering of the FeX layers in a stream of nitrogen and of oxygen, described above.
This deposit may be effected either by thermal evaporation or by cathode sputtering.
The deposition by cathode sputtering of anti-friction layers of molybdenum sulphide is already known.
Process and device for forming a coating on a substrate by cathode sputtering.
A method of manufacturing an article for cathode sputtering a silicon-containing composition which method comprises.
This lower polar part can also be produced by cathode sputtering.
Depositing a first layer by non-collimated cathode sputtering at normal incidence relative to the substrate ; and.
The actuator may be composed of piezoelectric elements deposited by cathode sputtering.
Rotating cylindrical cathode sputtering systems typically include a power source, a cathode, and a magnet assembly.
High voltage discharges are traditionally used for magnetron cathode sputtering.
FIG . 1 shows cathode sputtering apparatus for implementing the manufacturing method in accordance with the invention.
A target consisting of a mixture of chromium and chromium carbide was sputtered by cathode sputtering.
Cathode sputtering is advantageously used at the deposition step F 5.
The thin doping layer may also be made by deposition by cathode sputtering.
The cathode sputtering reactors are also called “ target ” reactors.
The deposition of the molybdenum layer may notably be achieved by cathode sputtering.
An article for cathode sputtering silicon-containing compositions comprising,.
The material may be deposited beforehand by means of vacuum vaporisation or cathode sputtering.
The electrode 9 . 1 can be deposited by cathode sputtering or vacuum deposition, for example.
The constitutive material of this layer may typically be deposited by cathode sputtering.
Actually, the deposition rate from cathode sputtering is less than 10 % of the total deposition rate.
Depositing a thin metallic layer on the at least one chalcogenide layer by cathode sputtering.
FIG . 1 is a diagram of a cathode sputtering installation.
From which the electrodes are formed are preferably deposited by cathode sputtering.
Here, the cathode sputtering installation was equipped as in Example 2.
The invention relates to a process for the preparation of a target component for cathode sputtering.
The cathode sputtering apparatus used is shown diagrammatically in FIG . 1.
The material forming this transparent and conductive electrode may notably be deposited by cathode sputtering.
Then a 1 um layer of aluminium is deposited by cathode sputtering to protect the lithium.
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Examples of using Cathode
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So the cathode is where reduction is taking place
Electric anode and cathode of the machine
A cathode ray tube without an electron gun
Examples of using Sputtering
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Fizzing and sputtering in his own grease
Sputtering technique forms versatile quasicrystalline coatings
It can also cause sputtering upon acceleration
