Examples of 'deposition step' in a sentence
Meaning of "deposition step"
deposition step - It refers to a stage or phase in a legal process where a witness gives sworn testimony outside of the courtroom, usually as part of the discovery process
How to use "deposition step" in a sentence
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deposition step
The deposition step is advantageously a coating operation.
A sequence of such passes is hereafter called a deposition step.
An electrolytic deposition step must now be performed.
Depositing a protective layer after said deposition step.
The deposition step was performed in a dark room at ambient temperature.
This concludes the deposition step.
The deposition step for the second metallisation area does not cover the second opening.
The first porous layer may be produced by implementing a deposition step.
The chemical deposition step described in example 2 is reproduced.
The substrate is then subjected to the autocatalytic metal deposition step.
Prior to the fusing step, a deposition step may be performed.
This serves as the interfaz to the next polysilicon deposition step.
Consequently, no additional deposition step is required to introduce such a metal compound.
The boron and the carbon are introduced during the deposition step.
Alternatively, the deposition step can be carried out on the protecting support.
See also
The position of the valve does not vary during the deposition step.
A platinum deposition step may be included before or after aluminising, preferably before.
The etching of the prestress layer takes place after the gate deposition step.
Preferably, pattern 2 is formed in a single deposition step with a first conductivity type.
The functional coating comprises at least one functional layer deposited during a magnetron deposition step.
The process of claim 4, wherein the deposition step comprises physical vapor deposition.
The precursor films have only weak photovoltaic properties per se after the deposition step.
According to one possibility, the zinc deposition step b can be carried out by electrolytic deposition.
Glue can be added to the substrate prior of after the SAP deposition step.
In the process described, the autocatalytic metal deposition step is a conventional copper deposition step.
Advantageously, the lines are formed in a single electrochemical deposition step.
In practice, the deposition step may comprise the sequence of steps of,.
This step is a non-selective deposition step.
Such a deposition step is schematized in FIG . 2 by arrows F located above mask 3.
In this case, a drying operation is interposed between each deposition step.
FIG . 6 is perspective diagram of a second deposition step according to a first embodiment of the invention ;.
For example, the growth step involves an electrolysis step or a chemical deposition step.
This deposition step 5 continues until the spaces between the areas 1 A to 1 C are filled.
Preparation method 3 is for facilitating the reception and growth of galvanic deposition step 5.
Thus, to advantage, the deposition step comprises,.
The initial slope corresponds to an increase of 4 charges per nm2 at each deposition step.
One preferred derivative for carrying out the deposition step is dichloro-di-p-xylylene.
The wheel 6 would be formed separately and attached after the chemical vapor deposition step.
Each deposition step lasted 28 seconds so as to obtain a 25 nm thick layer.
Most typical imperfections and / or defects encountered during the deposition step are those deriving from,.
Slight annealing for smoothing or further mechano-chemical polishing may be achieved after the deposition step.
The particles were dehydrogenated during the deposition step by applying a vacuum atmosphere ( approx . 1x103 Pas ).
Cathode sputtering is advantageously used at the deposition step F 5.
A basic weight of dry coating of approximately 15 g/m2 has been obtained with a single deposition step.
As represented in FIG . 6, a metallic catalyst deposition step is then performed.
FIG . 5 shows a semiconductor wafer undergoing an electrolytic deposition step.
Sputtering is beneficially used at the deposition step F 5.
The tube was calcined at 500 ° C. for one hour in air after each deposition step.
The transfer means 10 ensures this deposition step.
In effect FIG . 5 illustrates a sectional view of the flange 330 after the material deposition step.
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